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Pure Appl. Chem., 2000, Vol. 72, No. 11, pp. 2167-2175

http://dx.doi.org/10.1351/pac200072112167

High-temperature chemical vapor deposition. An effective tool for the production of coatings

G. Wahl1*, O. Stadel1, O. Gorbenko2 and A. Kaul2

1 Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, Technische Universität Braunschweig, Bienroder Weg 53, D 38108 Braunschweig, Germany
2 Moscow State University, Chemistry Department, Moscow 119899, Russia

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