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Pure Appl. Chem., 1999, Vol. 71, No. 7, pp. 1243-1248

http://dx.doi.org/10.1351/pac199971071243

Thermochemistry of silicon-containing materials

P. A. G. O’Hare

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  • Bai Fan, To Wai-Keung, Huang Zhifeng: Porosification-Induced Back-Bond Weakening in Chemical Etching of n-Si(111). J. Phys. Chem. C 2013, 117, 2203. <http://dx.doi.org/10.1021/jp311999u>