Pure Appl. Chem., 1999, Vol. 71, No. 10, pp. 1863-1869
http://dx.doi.org/10.1351/pac199971101863
Simulation of plasma processes for microelectronic fabrication
First page:
Pure Appl. Chem., 1999, Vol. 71, No. 10, pp. 1863-1869
http://dx.doi.org/10.1351/pac199971101863