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Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1193-1197

http://dx.doi.org/10.1351/pac199870061193

High rate deposition of thick epitaxial films by thermal plasma flash evaporation

K. Terashima, Norio Yamaguchi, Tomoyuki Hattori, Y. Takamura and T. Yoshida

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T. Yoshida
The future of thermal plasma processing for coating
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Chemistry of crown thioether complexes of low-valent second-row transition metals
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Stereoelectronic modulation of dioxygen coordination
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