Pure and Applied Chemistry, 1998, Volume 70, No. 6, pp. 1151-1156, Cited by

Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156

http://dx.doi.org/10.1351/pac199870061151

Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry

G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog

Sigel Reinhard: Light scattering near and from interfaces using evanescent wave and ellipsometric light scattering. Curr Opin Colloid Interface Sci 2009, 14, 426. <http://dx.doi.org/10.1016/j.cocis.2009.08.004>
Zeinert A., Arnas C., Dominique C., Mouberi A.: Optical properties of carbonaceous nanoparticles produced in sputtering discharges. J Vac Sci Technol A 2008, 26, 1450. <http://dx.doi.org/10.1116/1.2987950>
Liu Bin, Goree J., Nosenko V., Boufendi L.: Radiation pressure and gas drag forces on a melamine-formaldehyde microsphere in a dusty plasma. Phys Plasmas 2003, 10, 9. <http://dx.doi.org/10.1063/1.1526701>
Stoffels E., Stoffels W. W., Ceccone G., Hasnaoui R., Keune H., Wahl G., Rossi F.: MoS[sub 2] nanoparticle formation in a low pressure environment. J Appl Phys 1999, 86, 3442. <http://dx.doi.org/10.1063/1.371227>
Stoffels W., Stoffels E., Swinkels G., Boufnichel M., Kroesen G.: Etching a single micrometer-size particle in a plasma. Phys Rev E 1999, 59, 2302. <http://dx.doi.org/10.1103/PhysRevE.59.2302>