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Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156

http://dx.doi.org/10.1351/pac199870061151

Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry

G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog

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