Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156
http://dx.doi.org/10.1351/pac199870061151
Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry
First page:
Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156
http://dx.doi.org/10.1351/pac199870061151