Pure and Applied Chemistry, 1998, Volume 70, No. 2, pp. 477-484, Cited by

Pure Appl. Chem., 1998, Vol. 70, No. 2, pp. 477-484

http://dx.doi.org/10.1351/pac199870020477

Simulation of surface reactions

M. Frenklach

Marchack Nathan, Chang Jane P.: Chemical Processing of Materials on Silicon: More Functionality, Smaller Features, and Larger Wafers. Annu. Rev. Chem. Biomol. Eng. 2012, 3, 235. <http://dx.doi.org/10.1146/annurev-chembioeng-062011-080958>
Marchack Nathan, Chang Jane P: Perspectives in nanoscale plasma etching: what are the ultimate limits?. J Phys D Appl Phys 2011, 44, 174011. <http://dx.doi.org/10.1088/0022-3727/44/17/174011>
Graves David B, Brault Pascal: Molecular dynamics for low temperature plasma–surface interaction studies. J Phys D Appl Phys 2009, 42, 194011. <http://dx.doi.org/10.1088/0022-3727/42/19/194011>
Kraft Markus, Wagner Wolfgang: An improved stochastic algorithm for temperature-dependent homogeneous gas phase reactions. J COMP PHYSICS 2003, 185, 139. <http://dx.doi.org/10.1016/S0021-9991(02)00051-7>
Pettifor D., Oleinik I.: Analytic bond-order potentials beyond Tersoff-Brenner. I. Theory. Phys Rev B 1999, 59, 8487. <http://dx.doi.org/10.1103/PhysRevB.59.8487>