Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1107-1112
http://dx.doi.org/10.1351/pac199668051107
Analysis of Coulomb-crystal formation process for application to tailored particle synthesis in RF plasmas
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Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films