CrossRef enabled

PAC Archives

Archive →

Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1075-1081

Dissociation and atom recombination of H2 and D2 on metallic surfaces: A theoretical survey

M. Cacciatore and G. D. Billing

CrossRef Cited-by theme picture

CrossRef Cited-by Linking

  • Farley D.R., Stotler D.P., Lundberg D.P., Cohen S.A.: Modeling of hydrogen ground state rotational and vibrational temperatures in kinetic plasmas. J Quant Spectrosc Radiat 2011, 112, 800. <>
  • Rutigliano M., Cacciatore M.: Eley–Rideal recombination of hydrogen atoms on a tungsten surface. Phys Chem Chem Phys 2011, 13, 7475. <>
  • Moiseev T: Energy distributions of H and H2 in a Ar–SiH4–H2 plasma during transition from a-Si to nc-Si film deposition. Plasma Sources Sci Technol 2011, 20, 025007. <>
  • Benedetto S. Di, Bruno C.: Novel Semi-Empirical Model for Finite Rate Catalysis with Application to PM1000 Material. Journal of Thermophysics and Heat Transfer 2010, 24, 50. <>
  • Cacciatore M, Rutigliano M: Dynamics of plasma–surface processes: E–R and L–H atom recombination reactions. Plasma Sources Sci Technol 2009, 18, 023002. <>
  • Rutigliano M., Cacciatore M.: Isotope and Surface Temperature Effects for Hydrogen Recombination on a Graphite Surface. Chem Eur J of Chem Phys 2008, 9, 171. <>
  • Tskhakaya D., Kuhn S., Tomita Y., Matyash K., Schneider R., Taccogna F.: Self-Consistent Simulations of the Plasma-Wall Transition Layer. Contrib Plasma Phys 2008, 48, 121. <>
  • Cacciatore M, Rutigliano M: The semiclassical and quantum-classical approaches to elementary surface processes: dissociative chemisorption and atom recombination on surfaces. Phys Scr 2008, 78, 058115. <>
  • Taccogna F., Schneider R., Matyash K., Longo S., Capitelli M., Tskhakaya D.: Negative ion production near a divertor plate. J  Nucl Mater 2007, 363-365, 437. <>
  • Guerra Vasco: . IEEE Trans Plasma Sci 2007, 35, 1397. <>
  • Cacciatore M., Rutigliano M.: Semiclassical molecular dynamics simulation of surface processes: Application to the hydrogen atom recombination on graphite. Int J Quantum Chem 2006, 106, 631. <>
  • Capitelli M, Cacciatore M, Celiberto R, Pascale O. De, Diomede P, Esposito F, Gicquel A, Gorse C, Hassouni K, Laricchiuta A: Vibrational kinetics, electron dynamics and elementary processes in H2 and D2 plasmas for negative ion production: modelling aspects. Nucl Fusion 2006, 46, S260. <>
  • Cacciatore M, Rutigliano M: Recombination processes involving H and D atoms interacting with a graphite surface: collisional data relevant to fusion plasma devices. Phys Scr 2006, t124, 80. <>
  • Capitelli M., Gorse C.: . IEEE Trans Plasma Sci 2005, 33, 1832. <>
  • Capitelli M, Celiberto R, Esposito F, Laricchiuta A, Hassouni K, Longo S: Elementary processes and kinetics of H2 plasmas for different technological applications. Plasma Sources Sci Technol 2002, 11, A7. <>
  • Cacciatore M., Rutigliano M., Billing G. D.: Eley-Rideal and Langmuir-Hinshelwood Recombination Coefficients for Oxygen on Silica Surfaces. Journal of Thermophysics and Heat Transfer 1999, 13, 195. <>