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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1071-1074

Surface chemistry during plasma etching of silicon

V. M. Donnelly, I. P. Herman, C. C. Cheng and K. V. Guinn

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Luc Stafford, Joydeep Guha, Rohit Khare, Stefano Mattei, Olivier Boudreault, Boris Clain and Vincent M. Donnelly
Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas
2010, Vol. 82, Issue 6, pp. 1301-1315 [Details + Abstract] [Full text - pdf 549 kB]