Pure and Applied Chemistry, 1996, Volume 68, No. 5, pp. 1059-1063, Cited by

Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1059-1063

http://dx.doi.org/10.1351/pac199668051059

Measurements of CF_X and SiH_X radicals in ECR and RF plasmas used for material processing

T. Goto

Takahashi Kazuo, Tachibana Kunihide: Solid particle production in fluorocarbon plasmas II: Gas phase reactions for polymerization. J Vac Sci Technol A 2002, 20, 305. <http://dx.doi.org/10.1116/1.1434963>
Takahashi Kazuo, Itoh Atsushi, Nakamura Toshihiro, Tachibana Kunihide: Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas. This Solid Films 2000, 374, 303. <http://dx.doi.org/10.1016/S0040-6090(00)01160-3>
Tachibana Kunihide, Kamisugi Hideaki: Vacuum-ultraviolet laser absorption spectroscopy for absolute measurement of fluorine atom density in fluorocarbon plasmas. Appl Phys Lett 1999, 74, 2390. <http://dx.doi.org/10.1063/1.123861>