Pure and Applied Chemistry, 1996, Volume 68, No. 5, pp. 1059-1063

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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1059-1063

http://dx.doi.org/10.1351/pac199668051059

Measurements of CF_X and SiH_X radicals in ECR and RF plasmas used for material processing

T. Goto

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12th International Symposium on Plasma Chemistry, Minneapolis, USA, 21–26 August 1995

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