Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1059-1063
http://dx.doi.org/10.1351/pac199668051059
Measurements of CFX and SiHX radicals in ECR and RF plasmas used for material processing
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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1059-1063
http://dx.doi.org/10.1351/pac199668051059