Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1017-1022
http://dx.doi.org/10.1351/pac199668051017
From molecules to particles in silane plasmas
CrossRef Cited-by Linking
- Agarwal Pulkit, Girshick Steven L.: Numerical Modeling of an RF Argon–Silane Plasma with Dust Particle Nucleation and Growth. Plasma Chem Plasma Process 2014, 34, 489. <http://dx.doi.org/10.1007/s11090-013-9511-3>
- Mohan A., van der Wel C.M., Schropp R.E.I., Rath J.K.: Probing periodic oscillations in a silane dusty plasma in a very high-frequency plasma enhanced chemical vapor deposition process1. Can. J. Phys. 2014, 1. <http://dx.doi.org/10.1139/cjp-2013-0611>
- de Jong M. M., de Koning J., Rath J. K., Schropp R. E. I.: An optical analysis tool for avoiding dust formation in very-high frequency hydrogen diluted silane plasmas at low substrate temperatures. Phys Plasmas 2012, 19, 020703. <http://dx.doi.org/10.1063/1.3683559>
- Xu Shengzhi, Zhang Xiaodan, Li Yang, Xiong Shaozhen, Geng Xinhua, Zhao Ying: Improve silane utilization for silicon thin film deposition at high rate. This Solid Films 2011, 520, 694. <http://dx.doi.org/10.1016/j.tsf.2011.06.069>
- Bartlome R., Strahm B., Sinquin Y., Feltrin A., Ballif C.: Laser applications in thin-film photovoltaics. Appl Phys B 2010, 100, 427. <http://dx.doi.org/10.1007/s00340-009-3890-4>
- Peppernick Samuel J., Gunaratne K.D. Dasitha, Castleman A.W.: The relative abundances of silicon hydride clusters, SinHx− (n=8–12 and 0≤x≤25), investigated with high-resolution time-of-flight mass spectrometry. Int J Mass Spectrosc 2010, 290, 65. <http://dx.doi.org/10.1016/j.ijms.2009.12.005>
- Kortshagen Uwe: Nonthermal plasma synthesis of semiconductor nanocrystals. J Phys D Appl Phys 2009, 42, 113001. <http://dx.doi.org/10.1088/0022-3727/42/11/113001>
- Nunomura Shota, Shiratani Masaharu, Koga Kazunori, Kondo Michio, Watanabe Yukio: Nanoparticle coagulation in fractionally charged and charge fluctuating dusty plasmas. Phys Plasmas 2008, 15, 080703. <http://dx.doi.org/10.1063/1.2972162>
- Gordillo-Vázquez F. J., Herrero V. J., Tanarro I.: From Carbon Nanostructures to New Photoluminescence Sources: An Overview of New Perspectives and Emerging Applications of Low-Pressure PECVD. Chem Vap Deposition 2007, 13, 267. <http://dx.doi.org/10.1002/cvde.200604034>
- Operti Lorenza, Rabezzana Roberto, Vaglio Gian Angelo: Negative gas-phase ion chemistry of silane: a quadrupole ion trap study. Rapid Commun Mass Spectrom 2006, 20, 2696. <http://dx.doi.org/10.1002/rcm.2662>
- Kim Kyo-Seon, Kim Dong-Joo, Qiu Zhao Qian: Numerical analysis on particle coating by the pulsed plasma process. Chem Eng Set 2006, 61, 3278. <http://dx.doi.org/10.1016/j.ces.2005.12.003>
- Watanabe Y: Formation and behaviour of nano/micro-particles in low pressure plasmas. J Phys D Appl Phys 2006, 39, R329. <http://dx.doi.org/10.1088/0022-3727/39/19/R01>
- Chaudhuri P., Gupta N. Dutta, Bhaduri A., Longeaud C., Vignoli S., Marty O.: Powder evolution at low powers in silane-argon discharge. J Appl Phys 2005, 98, 044913. <http://dx.doi.org/10.1063/1.2011778>
- Vladimirov S.V., Ostrikov K.: Dynamic self-organization phenomena in complex ionized gas systems: new paradigms and technological aspects. Phys Rep 2004, 393, 175. <http://dx.doi.org/10.1016/j.physrep.2003.12.003>
- Gallagher Alan, Howling A. A., Hollenstein Ch.: Anion reactions in silane plasma. J Appl Phys 2002, 91, 5571. <http://dx.doi.org/10.1063/1.1459758>
- Viera G., Mikikian M., Bertran E., Cabarrocas P. Roca i, Boufendi L.: Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas. J Appl Phys 2002, 92, 4684. <http://dx.doi.org/10.1063/1.1506382>
- Leroux A., Kessels W. M. M., Schram D. C., van de Sanden M. C. M.: Modeling of the formation of cationic silicon clusters in a remote Ar/H[sub 2]/SiH[sub 4] plasma. J Appl Phys 2000, 88, 537. <http://dx.doi.org/10.1063/1.373692>
- Schwarzenbach W., Cunge G., Booth J. P.: High mass positive ions and molecules in capacitively-coupled radio-frequency CF[sub 4] plasmas. J Appl Phys 1999, 85, 7562. <http://dx.doi.org/10.1063/1.370555>
- Deschenaux Ch, Affolter A, Magni D, Hollenstein Ch, Fayet P: J Phys D Appl Phys 1999, 32, 1876. <http://dx.doi.org/10.1088/0022-3727/32/15/316>
- Grangeon F, Monard C, Dorier J-L, Howling A A, Hollenstein Ch, Romanini D, Sadeghi N: Plasma Sources Sci Technol 1999, 8, 448. <http://dx.doi.org/10.1088/0963-0252/8/3/315>
- Hollenstein Ch., Howling A. A., Courteille C., Dorier J.-L., Sansonnens L., Magni D., Müller H.: Dust Particle Diagnostics in Rf Plasma Deposition of Silicon and Silicon Oxide Films (Invited). MRS Proc 1998, 507, 547. <http://dx.doi.org/10.1557/PROC-507-547>
- Dutta J., Hofmann H., Houriet R., Hofmeister H., Hollenstein C.: Growth, microstructure and sintering behavior of nanosized silicon powders. Colloid Surf A Phys Eng Aspects 1997, 127, 263. <http://dx.doi.org/10.1016/S0927-7757(97)00107-6>