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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1007-1010

http://dx.doi.org/10.1351/pac199668051007

New frontiers in thermal plasma processing

M. I. Boulos

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  • Kuloba Patrick W., Gumbe Lawrence O., Okoth Michael W., Obanda Martin, Ng'ang'a Fredrick M.: An investigation into low-temperature nitrogen plasma environment effect on the content of polyphenols during withering in made Kenyan tea. Int J Food Sci Technol 2014, 49, 1020. <http://dx.doi.org/10.1111/ijfs.12395>
  • Yao Yaochun, Watanabe Takayuki: In-flight Melting Behavior of Granulated Alkali-Free Raw Material in Induction Thermal Plasmas. Plasma Chem Plasma Process 2013, 33, 1111. <http://dx.doi.org/10.1007/s11090-013-9490-4>
  • Fabry Frédéric, Rehmet Christophe, Rohani Vandad, Fulcheri Laurent: Waste Gasification by Thermal Plasma: A Review. Waste Biomass Valor 2013, 4, 421. <http://dx.doi.org/10.1007/s12649-013-9201-7>
  • Tang L., Huang H., Hao H., Zhao K.: Development of plasma pyrolysis/gasification systems for energy efficient and environmentally sound waste disposal. Journal of Electrostatics 2013, 71, 839. <http://dx.doi.org/10.1016/j.elstat.2013.06.007>
  • Colombo V, Ghedini E, Gherardi M, Sanibondi P: Modelling for the optimization of the reaction chamber in silicon nanoparticle synthesis by a radio-frequency induction thermal plasma. Plasma Sources Sci. Technol. 2012, 21, 055007. <http://dx.doi.org/10.1088/0963-0252/21/5/055007>
  • Essiptchouk A.: Influence of inlet conditions on vortex characteristics. J Eng Phys Thermophys 2011, 84, 1126. <http://dx.doi.org/10.1007/s10891-011-0576-7>
  • Colombo V, Ghedini E, Sanibondi P: Three-dimensional investigation of particle treatment in an RF thermal plasma with reaction chamber. Plasma Sources Sci Technol 2010, 19, 065024. <http://dx.doi.org/10.1088/0963-0252/19/6/065024>
  • Bica Ioan: Steady current plasma macro-nanotechnologies. Journal of Industrial and Engineering Chemistry 2009, 15, 304. <http://dx.doi.org/10.1016/j.jiec.2008.11.016>
  • Kulkarni Naveen V., Karmakar Soumen, Banerjee Indrani, Sahasrabudhe S.N., Das A.K., Bhoraskar S.V.: Growth of nano-particles of Al2O3, AlN and iron oxide with different crystalline phases in a thermal plasma reactor. Mat Res Bul 2009, 44, 581. <http://dx.doi.org/10.1016/j.materresbull.2008.07.008>
  • Essiptchouk A M, Charakhovski L I, Filho G P, Maciel H S, Otani Ch, Barros E A: Thermal and power characteristics of plasma torch with reverse vortex. J Phys D Appl Phys 2009, 42, 175205. <http://dx.doi.org/10.1088/0022-3727/42/17/175205>
  • Yao Yaochun, Yatsuda Kazuyuki, Watanabe Takayuki, Funabiki Fuji, Yano Tetsuji: Investigation on in-flight melting behavior of granulated alkali-free glass raw material under different conditions with 12-phase AC arc. Chem Eng J 2008, 144, 317. <http://dx.doi.org/10.1016/j.cej.2008.06.039>
  • Yoshimura H.N., Abreu A.P., Molisani A.L., de Camargo A.C., Portela J.C.S., Narita N.E.: Evaluation of aluminum dross waste as raw material for refractories. J Ceram Int 2008, 34, 581. <http://dx.doi.org/10.1016/j.ceramint.2006.12.007>
  • Huang H., Tang L.: Treatment of organic waste using thermal plasma pyrolysis technology. Journal of Energy Conversion and Management 2007, 48, 1331. <http://dx.doi.org/10.1016/j.enconman.2006.08.013>
  • Xianliang Jiang, Boulos M I: Heat Transfer During Radio Frequency Inductively Coupled Plasma Deposition of Tungsten. Plasma Sci Tech 2007, 9, 427. <http://dx.doi.org/10.1088/1009-0630/9/4/09>
  • Ye Rubin, Ishigaki Takamasa, Taguchi Hiroyuki, Ito Shigeru, Murphy Anthony B., Lange Hubert: Characterization of the behavior of chemically reactive species in a nonequilibrium inductively coupled argon-hydrogen thermal plasma under pulse-modulated operation. J Appl Phys 2006, 100, 103303. <http://dx.doi.org/10.1063/1.2364623>
  • Shin J W, Miyazoe H, Leparoux M, Siegmann St, Dorier J L, Hollenstein Ch: The influence of process parameters on precursor evaporation for alumina nanopowder synthesis in an inductively coupled rf thermal plasma. Plasma Sources Sci Technol 2006, 15, 441. <http://dx.doi.org/10.1088/0963-0252/15/3/020>
  • Xiaozhen Feng: Enthalpy Probe Technique for Thermal Plasma Diagnostics. Plasma Sci Tech 2003, 5, 1909. <http://dx.doi.org/10.1088/1009-0630/5/4/012>
  • Chae Y. K., Ohno H., Eguchi K., Yoshida T.: Ultrafast deposition of microcrystalline Si by thermal plasma chemical vapor deposition. J Appl Phys 2001, 89, 8311. <http://dx.doi.org/10.1063/1.1370365>
  • Pranevicius L., Pranevicius L.L., Valatkevicius P., Valincius V.: Plasma spray deposition of Al-Al2O3 coatings doped with metal oxides: catalytic applications. Surface Coatings and Technology 2000, 123, 122. <http://dx.doi.org/10.1016/S0257-8972(99)00520-4>
  • Valatkevicius P., Pranevicius L.L., Valincius V., Montassier C.: Catalytic behavior of plasma-sprayed Al–Al2O3 coatings doped with metal oxides. Surface Coatings and Technology 2000, 125, 392. <http://dx.doi.org/10.1016/S0257-8972(99)00584-8>
  • Henne R.: Thermal Plasmas for Material Processing. Contrib Plasma Phys 1999, 39, 385. <http://dx.doi.org/10.1002/ctpp.2150390503>
  • Fauchais P., Vardelle A., Denoirjean A.: Reactive thermal plasmas: ultrafine particle synthesis and coating deposition. Surface Coatings and Technology 1997, 97, 66. <http://dx.doi.org/10.1016/S0257-8972(97)00294-6>
  • Fauchais P., Vardelle A.: Thermal plasmas. IEEE Trans Plasma Sci 1997, 25, 1258. <http://dx.doi.org/10.1109/27.650901>