Pure and Applied Chemistry, 1994, Volume 66, No. 6, pp. 1397-1404, Cited by

Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404

http://dx.doi.org/10.1351/pac199466061397

Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas

A. Ohl

OHL A.: ChemInform Abstract: Plasmaphysical and Plasmachemical Aspects of Diamond Deposition in Low Pressure Plasma. ChemInform 2010, 25, no. <http://dx.doi.org/10.1002/chin.199452318>
Chatei Hassan, Bougdira Jamal, Remy Michel, Alnot Patrick: Optical emission diagnostics of permanent and pulsed microwave discharges in H2–CH4–N2 for diamond deposition. Surface and Coatings Technology 1999, 116-119, 1233. <http://dx.doi.org/10.1016/S0257-8972(99)00109-7>