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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404

Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas

A. Ohl

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  • OHL A.: ChemInform Abstract: Plasmaphysical and Plasmachemical Aspects of Diamond Deposition in Low Pressure Plasma. ChemInform 2010, 25, no. <>
  • Chatei Hassan, Bougdira Jamal, Remy Michel, Alnot Patrick: Optical emission diagnostics of permanent and pulsed microwave discharges in H2–CH4–N2 for diamond deposition. Surface and Coatings Technology 1999, 116-119, 1233. <>