Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404
http://dx.doi.org/10.1351/pac199466061397
Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
First page:
Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404
http://dx.doi.org/10.1351/pac199466061397