Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404
http://dx.doi.org/10.1351/pac199466061397
Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
First page:
![First page image](/publications/pac/pdf/first_pages/6606x1397.jpg)
Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1397-1404
http://dx.doi.org/10.1351/pac199466061397