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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1381-1388

Real-time monitoring of surface chemistry during plasma processing

E. S. Aydil, R. A. Gottscho and Y. J. Chabal

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  • AYDIL E. S., GOTTSCHO R. A., CHABAL Y. J.: ChemInform Abstract: Real-Time Monitoring of Surface Chemistry During Plasma Processing. ChemInform 2010, 25, no. <>
  • Han Y., Mayer D., Offenhäusser A., Ingebrandt S.: Surface activation of thin silicon oxides by wet cleaning and silanization. This Solid Films 2006, 510, 175. <>
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  • Marra D.C, Kessels W.M.M, van de Sanden M.C.M, Kashefizadeh K, Aydil E.S: Surface hydride composition of plasma deposited hydrogenated amorphous silicon: in situ infrared study of ion flux and temperature dependence. Surf Sei 2003, 530, 1. <>
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  • van Hest M. F. A. M., Klaver A., Schram D. C., van de Sanden M. C. M.: Design of a fast in situ infrared diagnostic tool. Rev Sci Instrum 2003, 74, 2675. <>
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  • Duan H.L, Zaharias G.A, Bent Stacey F: Detecting reactive species in hot wire chemical vapor deposition. Curr Opin Solid State Mater 2002, 6, 471. <>
  • Bermudez V. M., DeSisto W. J.: Study of chromium oxide film growth by chemical vapor deposition using infrared reflection absorption spectroscopy. J Vac Sci Technol A 2001, 19, 576. <>
  • Duan H. L., Bent Stacey F.: In Situ Diagnostics of Methane/Hydrogen Plasma Interactions with Si(100). Mater Res Soc Proc 1999, 569, 179. <>
  • Oehrlein Gottlieb S.: Surface processes in low pressure plasmas. Surf Sei 1997, 386, 222. <>
  • Han Sang M., Aydil Eray S.: Detection of combinative infrared absorption bands in thin silicon dioxide films. Appl Phys Lett 1997, 70, 3269. <>
  • Edelberg Erik, Bergh Sam, Naone Ryan, Hall Michael, Aydil Eray S.: Luminescence from plasma deposited silicon films. J Appl Phys 1997, 81, 2410. <>
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