Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1381-1388
http://dx.doi.org/10.1351/pac199466061381
Real-time monitoring of surface chemistry during plasma processing
First page:
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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1381-1388
http://dx.doi.org/10.1351/pac199466061381