Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1381-1388
http://dx.doi.org/10.1351/pac199466061381
Real-time monitoring of surface chemistry during plasma processing
First page:
Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1381-1388
http://dx.doi.org/10.1351/pac199466061381