Pure and Applied Chemistry

CrossRef Cited-by Linking

• Lackner Juergen M., Wiesinger Martin, Kaindl Reinhard, Waldhauser Wolfgang, Heim Daniel, Hartmann Paul: Plasma Polymerization Inside Tubes in Hexamethyldisiloxanes and Ethyne Glow Discharges: Effects of Deposition Atmosphere on Wetting and Ageing in Solvents. Plasma Chem Plasma Process 2014, 34, 259. <http://dx.doi.org/10.1007/s11090-013-9519-8>
• Kale Kiran H., Palaskar Shital S.: Plasma enhanced chemical vapor deposition of tetraethylorthosilicate and hexamethyldisiloxane on polyester fabrics under pulsed and continuous wave discharge. J App Pol Sci 2012, n/a. <http://dx.doi.org/10.1002/app.36601>
• Fanelli Fiorenza, Lovascio Sara, d'Agostino Riccardo, Fracassi Francesco: Insights into the Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition of Thin Films from Methyldisiloxane Precursors. Plasma Processes Polym. 2012, 9, 1132. <http://dx.doi.org/10.1002/ppap.201100157>
• Noborisaka Mayui, Kodama Hideyuki, Nagashima So, Shirakura Akira, Horiuchi Takahiro, Suzuki Tetsuya: Synthesis of transparent and hard SiOC(−H) thin films on polycarbonate substrates by PECVD method. Surface Coatings and Technology 2012, 206, 2581. <http://dx.doi.org/10.1016/j.surfcoat.2011.11.017>
• Kale Kiran H., Palaskar Shital S.: Structural studies of plasma polymers obtained in pulsed dielectric barrier discharge of TEOS and HMDSO on nylon 66 fabrics. Journal of The Textile Institute 2012, 103, 1088. <http://dx.doi.org/10.1080/00405000.2012.660757>
• FAVIA P., D'AGOSTINO R., FRACASSI F.: ChemInform Abstract: Plasma and Surface Diagnostics in PECVD Silicon Containing Organic Monomers. ChemInform 2010, 25, no. <http://dx.doi.org/10.1002/chin.199452316>
• Coclite Anna Maria, Milella Antonella, d'Agostino Riccardo, Palumbo Fabio: On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like films. Surface Coatings and Technology 2010, 204, 4012. <http://dx.doi.org/10.1016/j.surfcoat.2010.05.024>
• Sonnenfeld Axel, Bieder Andrea, Rudolf von Rohr Philipp: Influence of the Gas Phase on the Water Vapor Barrier Properties of SiOx Films Deposited from RF and Dual-Mode Plasmas. Plasma Process Polym 2006, 3, 606. <http://dx.doi.org/10.1002/ppap.200500159>
• Lewis Hilton G. Pryce, Casserly Thomas B., Gleason Karen K.: Hot-Filament Chemical Vapor Deposition of Organosilicon Thin Films from Hexamethylcyclotrisiloxane and Octamethylcyclotetrasiloxane. J Electrochem Soc 2001, 148, F212. <http://dx.doi.org/10.1149/1.1415723>
• Denes A. R., Tshabalala M. A., Rowell R., Denes F., Young R.A.: Hexamethyldisiloxane-Plasma Coating of Wood Surfaces for Creating Water Repellent Characteristics. hfsg 1999, 53, 318. <http://dx.doi.org/10.1515/HF.1999.052>
• Favia Pietro, d’Agostino Riccardo: Plasma treatments and plasma deposition of polymers for biomedical applications. Surface Coatings and Technology 1998, 98, 1102. <http://dx.doi.org/10.1016/S0257-8972(97)00285-5>
• Lamendola Ritalba, d’Agostino Riccardo, Fracassi Francesco: Thin film deposition from hexamethyldisiloxane fed glow discharges. Plasmas Polym 1997, 2, 147. <http://dx.doi.org/10.1007/BF02766151>