Electron cyclotron resonance plasma etching of Si with Cl<sub>2</sub>: Plasma chemistry and mechanisms

PAC → Archive → Vol. 66 (1994) → Issue 6 → Electron cyclotron resonance plasma…

Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1327-1334

http://dx.doi.org/10.1351/pac199466061327

Electron cyclotron resonance plasma etching of Si with Cl₂: Plasma chemistry and mechanisms

K. Ono, M. Tuda, H. Ootera and T. Oomori

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