Pure and Applied Chemistry

CrossRef Cited-by Linking

• Kausik S. S., Kakati B., Saikia B. K.: Effect of confining wall potential on charged collimated dust beam in low-pressure plasma. Phys. Plasmas 2013, 20, 053702. <http://dx.doi.org/10.1063/1.4803069>
• Kim Yeonwon, Hatozaki Kosuke, Hashimoto Yuji, Uchida Giichiro, Kamataki Kunihiro, Itagaki Naho, Seo Hyunwoong, Koga Kazunori, Shiratani Masaharu: Correlation between Volume Fraction of Silicon Clusters in Amorphous Silicon Films and Optical Emission Properties of Si$^{*}$ and SiH$^{*}$. Jpn. J. Appl. Phys. 2013, 52, 11NA07. <http://dx.doi.org/10.7567/JJAP.52.11NA07>
• Sobczyk A. T., Jaworek A., Sobisz Z.: Carbon microflowers. Mater Sci-Pol 2012, 30, 53. <http://dx.doi.org/10.2478/s13536-012-0005-4>
• Sodha Mahendra Singh, Misra Shikha, Mishra S. K., Srivastava Sweta: Growth of embryonic dust particles in a complex plasma. J Appl Phys 2010, 107, 103307. <http://dx.doi.org/10.1063/1.3410676>
• Petcu M C, Sarkar A, Bronneberg A C, Creatore M, van de Sanden M C M: Ion probe detection of clusters in a remotely expanding thermal plasma. Plasma Sources Sci Technol 2010, 19, 065012. <http://dx.doi.org/10.1088/0963-0252/19/6/065012>
• Dominique C., Arnas C.: Cathode sputtering and the resulting formation of carbon nanometer-size dust. J Appl Phys 2007, 101, 123304. <http://dx.doi.org/10.1063/1.2748365>
• Smirnov R., Tskhakaya Y. Tomita2, D., Takizuka T.: Two-Dimensional Simulation Study on Charging of Dust Particle on Plasma-FacingWall. Contrib Plasma Phys 2006, 46, 623. <http://dx.doi.org/10.1002/ctpp.200610054>
• Olevanov M. A., Mankelevich Yu. A., Rakhimova T. V.: Coagulation and growth mechanisms for dust particles in a low-temperature plasma. Sov Phys JETP 2004, 98, 287. <http://dx.doi.org/10.1134/1.1675896>
• Olevanov M. A., Mankelevich Yu. A., Rakhimova T. V.: Coagulation rate of dust grains in a low-temperature plasma. Tech Phys 2003, 48, 1270. <http://dx.doi.org/10.1134/1.1620120>
• Childs M. A., Gallagher Alan: Small particle growth in silane radio-frequency discharges. J Appl Phys 2000, 87, 1076. <http://dx.doi.org/10.1063/1.371982>
• Wang Dezhen, Liu Deyong, Liu Jinyuan: Dust charging and levitating in cathode sheath of glow discharges with energetic electron beam. J Appl Phys 2000, 88, 1276. <http://dx.doi.org/10.1063/1.373815>
• Burden A.P, Anguita J.V, Silva S.R.P: Microstructural characterisation of carbonaceous dust generated during the deposition of diamond-like carbon coatings. This Solid Films 1998, 332, 252. <http://dx.doi.org/10.1016/S0040-6090(98)00993-6>
• Hollenstein Ch., Howling A. A., Courteille C., Dorier J.-L., Sansonnens L., Magni D., Müller H.: Dust Particle Diagnostics in Rf Plasma Deposition of Silicon and Silicon Oxide Films (Invited). MRS Proc 1998, 507, 547. <http://dx.doi.org/10.1557/PROC-507-547>
• Tews R., Suchaneck G., Kottwitz A.: A model for high-rate film deposition from dusty RF discharges. Surface Coatings and Technology 1997, 97, 79. <http://dx.doi.org/10.1016/S0257-8972(97)00193-X>
• Jelenković B. M., Gallagher Alan: Particle accumulation in a flowing silane discharge. J Appl Phys 1997, 82, 1546. <http://dx.doi.org/10.1063/1.365955>
• Fridman A. A., Boufendi L., Hbid T., Potapkin B. V., Bouchoule A.: Dusty plasma formation: Physics and critical phenomena. Theoretical approach. J Appl Phys 1996, 79, 1303. <http://dx.doi.org/10.1063/1.361026>