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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1311-1318

http://dx.doi.org/10.1351/pac199466061311

The reactive sputtering of oxides and nitrides

R. P. Howson

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  • Cacucci Arnaud, Loffredo Stéphane, Potin Valérie, Imhoff Luc, Martin Nicolas: Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers. Surface and Coatings Technology 2013, 227, 38. <http://dx.doi.org/10.1016/j.surfcoat.2012.10.064>
  • Kischkat Jan, Peters Sven, Gruska Bernd, Semtsiv Mykhaylo, Chashnikova Mikaela, Klinkmüller Matthias, Fedosenko Oliana, Machulik Stephan, Aleksandrova Anna, Monastyrskyi Gregorii, Flores Yuri, Ted Masselink W.: Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride. Appl. Opt. 2012, 51, 6789. <http://dx.doi.org/10.1364/AO.51.006789>
  • HOWSON R. P.: ChemInform Abstract: The Reactive Sputtering of Oxides and Nitrides. ChemInform 2010, 25, no. <http://dx.doi.org/10.1002/chin.199452315>
  • Danson Nigel, Hall Gareth W, Howson Ronald P: Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties. This Solid Films 1996, 289, 99. <http://dx.doi.org/10.1016/S0040-6090(96)08881-5>