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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1223-1230

The future of thermal plasma processing for coating

T. Yoshida

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Other PAC articles by these authors

K. Terashima, Norio Yamaguchi, Tomoyuki Hattori, Y. Takamura and T. Yoshida
High rate deposition of thick epitaxial films by thermal plasma flash evaporation
1998, Vol. 70, Issue 6, pp. 1193-1197 [Details] [Full text - pdf 494 kB]
T. Yoshida, Tomohiro Adachi and T. Ueda
Chemistry of crown thioether complexes of low-valent second-row transition metals
1990, Vol. 62, Issue 6, pp. 1127-1130 [Details] [Full text - pdf 320 kB]
T. Yoshida, K. Tatsumi and S. Otuska
Stereoelectronic modulation of dioxygen coordination
1980, Vol. 52, Issue 3, pp. 713-727 [Details] [Full text - pdf 411 kB]