Pure and Applied Chemistry, 1994, Volume 66, No. 6, pp. 1223-1230, Other PAC articles by these authors

PAC → Archive → Vol. 66 (1994) → Issue 6 → The future of thermal plasma processing… → Other PAC articles by these authors

Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1223-1230

http://dx.doi.org/10.1351/pac199466061223

The future of thermal plasma processing for coating

T. Yoshida

K. Terashima, Norio Yamaguchi, Tomoyuki Hattori, Y. Takamura and T. Yoshida

High rate deposition of thick epitaxial films by thermal plasma flash evaporation

T. Yoshida, Tomohiro Adachi and T. Ueda

Chemistry of crown thioether complexes of low-valent second-row transition metals

T. Yoshida, K. Tatsumi and S. Otuska

Stereoelectronic modulation of dioxygen coordination