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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1223-1230

http://dx.doi.org/10.1351/pac199466061223

The future of thermal plasma processing for coating

T. Yoshida

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  • Kambara M., Kitayama A., Homma K., Hideshima T., Kaga M., Sheem K.-Y., Ishida S., Yoshida T.: Nano-composite Si particle formation by plasma spraying for negative electrode of Li ion batteries. J. Appl. Phys. 2014, 115, 143302. <http://dx.doi.org/10.1063/1.4870600>
  • Wu Sudong, Kambara Makoto, Yoshida Toyonobu: Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition. Plasma Chem Plasma Process 2013, 33, 433. <http://dx.doi.org/10.1007/s11090-013-9439-7>
  • Chen L.W., Shibuta Y., Kambara M., Yoshida T.: Nanocluster dynamics in fast rate epitaxy under mesoplasma condition. Chemical Physics Letters 2013, 564, 47. <http://dx.doi.org/10.1016/j.cplett.2013.02.005>
  • Guittienne Ph., Grange D., Hollenstein Ch., Gindrat M.: Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes. J Thermal Spray Technology 2012, 21, 202. <http://dx.doi.org/10.1007/s11666-011-9702-5>
  • Rönkkönen Hanne, Klemkaitė Kristina, Khinsky Alexander, Baltušnikas Arūnas, Simell Pekka, Reinikainen Matti, Krause Outi, Niemelä Marita: Thermal plasma-sprayed nickel catalysts in the clean-up of biomass gasification gas. Fuel 2011, 90, 1076. <http://dx.doi.org/10.1016/j.fuel.2010.11.019>
  • Shigeta Masaya, Murphy Anthony B: Thermal plasmas for nanofabrication. J Phys D Appl Phys 2011, 44, 174025. <http://dx.doi.org/10.1088/0022-3727/44/17/174025>
  • YOSHIDA T.: ChemInform Abstract: The Future of Thermal Plasma Processing for Coating. ChemInform 2010, 25, no. <http://dx.doi.org/10.1002/chin.199452313>
  • Rampon Régine, Filiatre Claudine, Bertrand Ghislaine: Suspension Plasma Spraying of YPSZ Coatings: Suspension Atomization and Injection. J Therm Spray Technol 2008, 17, 105. <http://dx.doi.org/10.1007/s11666-007-9143-3>
  • Li Jianqiang, Huang Heji, Ma Tian, Eguchi Keisuke, Yoshida Toyonobu: Twin-Structured Yttria-Stabilized t' Zirconia Coatings Deposited by Plasma Spray Physical Vapor Deposition: Microstructure and Mechanical Properties. J Amer Ceram Soc 2007, 90, 603. <http://dx.doi.org/10.1111/j.1551-2916.2006.01445.x>
  • Liu Chang-jun, Vissokov Gheorghi P., Jang Ben W.-L.: Catalyst preparation using plasma technologies. Catal Today 2002, 72, 173. <http://dx.doi.org/10.1016/S0920-5861(01)00491-6>
  • Han P., Yoshida T.: Numerical investigation of thermophoretic effects on cluster transport during thermal plasma deposition process. J Appl Phys 2002, 91, 1814. <http://dx.doi.org/10.1063/1.1433182>
  • Han P., Yoshida T.: Growth and transport of clusters in thermal plasma vapor deposition of silicon. J Appl Phys 2002, 92, 4772. <http://dx.doi.org/10.1063/1.1506396>
  • Bouyer E., Schiller G., Müller M., Henne R. H.: Characterization of SiC and Si3N4 coatings synthesized by means of inductive thermal plasma from disilane precursors. Appl Organometal Chem 2001, 15, 833. <http://dx.doi.org/10.1002/aoc.237>
  • Ismagilov Z.R, Pushkarev V.V, Podyacheva O.Yu, Koryabkina N.A, Veringa H: A catalytic heat-exchanging tubular reactor for combining of high temperature exothermic and endothermic reactions. Chem Eng J 2001, 82, 355. <http://dx.doi.org/10.1016/S1385-8947(00)00349-1>
  • Chae Y. K., Ohno H., Eguchi K., Yoshida T.: Ultrafast deposition of microcrystalline Si by thermal plasma chemical vapor deposition. J Appl Phys 2001, 89, 8311. <http://dx.doi.org/10.1063/1.1370365>
  • Henne R.: Thermal Plasmas for Material Processing. Contrib Plasma Phys 1999, 39, 385. <http://dx.doi.org/10.1002/ctpp.2150390503>
  • Ismagilov Z.R, Podyacheva O.Yu, Solonenko O.P, Pushkarev V.V, Kuz'min V.I, Ushakov V.A, Rudina N.A: Application of plasma spraying in the preparation of metal-supported catalysts. Catal Today 1999, 51, 411. <http://dx.doi.org/10.1016/S0920-5861(99)00030-9>
  • Fauchais P., Vardelle A., Denoirjean A.: Reactive thermal plasmas: ultrafine particle synthesis and coating deposition. Surface Coatings and Technology 1997, 97, 66. <http://dx.doi.org/10.1016/S0257-8972(97)00294-6>
  • Hayasaki Kei, Takamura Yuzuru, Yamaguchi Norio, Terashima Kazuo, Yoshida Toyonobu: Scanning tunneling microscopy of epitaxial YBa[sub 2]Cu[sub 3]O[sub 7−x] films prepared by thermal plasma flash evaporation method. J Appl Phys 1997, 81, 1222. <http://dx.doi.org/10.1063/1.364143>
  • Fauchais P., Vardelle A.: Thermal plasmas. IEEE Trans Plasma Sci 1997, 25, 1258. <http://dx.doi.org/10.1109/27.650901>