1994, Vol. 66, Issue 6
- Eleventh International Symposium on Plasma Chemistry, Loughborough, UK, 22–27 August 1993
- IUPAC Technical Reports and Recommendations
Eleventh International Symposium on Plasma Chemistry, Loughborough, UK, 22–27 August 1993
This conference is part of the Plasma Chemistry series.
Plenary Lectures
The chemistry of etching and deposition processes
p. 1185 [Details] [Full text - pdf 591 kB]
Mass and optical emission spectroscopy of plasmas for diamond synthesis
p. 1195 [Details] [Full text - pdf 707 kB]
Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
p. 1207 [Details] [Full text - pdf 467 kB]
Review of plasma development in the former Soviet Union
p. 1215 [Details] [Full text - pdf 619 kB]
The future of thermal plasma processing for coating
p. 1223 [Details] [Full text - pdf 599 kB]
Section: Thermal Plasmas
Plasma fluidized and spouted bed reactors: An overview
p. 1231 [Details] [Full text - pdf 471 kB]
High temperature processing and numerical modelling of thermal plasmas in Norway
p. 1239 [Details] [Full text - pdf 490 kB]
Plasma spraying: Present and future
p. 1247 [Details] [Full text - pdf 968 kB]
Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
p. 1259 [Details] [Full text - pdf 620 kB]
Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
p. 1267 [Details] [Full text - pdf 651 kB]
Modelling of dielectric barrier discharge chemistry
p. 1275 [Details] [Full text - pdf 1285 kB]
Theory of electric corona including the role of plasma chemistry
p. 1287 [Details] [Full text - pdf 641 kB]
High power plasma arc melting process for incinerated ash contraction
p. 1295 [Details] [Full text - pdf 444 kB]
Gliding arc: Applications to engineering and environment control
p. 1301 [Details] [Full text - pdf 1156 kB]
Section: Low Pressure Plasmas
The reactive sputtering of oxides and nitrides
p. 1311 [Details] [Full text - pdf 465 kB]
Nucleation, growth, and morphology of dust in plasmas
p. 1319 [Details] [Full text - pdf 1592 kB]
Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
p. 1327 [Details] [Full text - pdf 1080 kB]
Plasma processing techniques used at Caswell
p. 1335 [Details] [Full text - pdf 2371 kB]
Processing of electronic materials by microwave plasma
p. 1343 [Details] [Full text - pdf 844 kB]
Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
p. 1353 [Details] [Full text - pdf 666 kB]
Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
p. 1363 [Details] [Full text - pdf 2776 kB]
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
p. 1373 [Details] [Full text - pdf 534 kB]
Real-time monitoring of surface chemistry during plasma processing
p. 1381 [Details] [Full text - pdf 618 kB]
The fullerenes: Precursors for 21st century materials
p. 1389 [Details] [Full text - pdf 569 kB]
Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
p. 1397 [Details] [Full text - pdf 590 kB]
IUPAC Technical Reports and Recommendations
Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
p. 1405 [Details] [Full text - pdf 1529 kB]