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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 751-758

http://dx.doi.org/10.1351/pac199264050751

Diamond synthesis by thermal-plasma CVD (chemical vapor deposition)

Seiichiro Matsumoto, Ikuo Hosoya, Yuji Manabe and Yukinobu Hibion

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  • Zhang Haibao, Bai Liuyang, Hu Peng, Yuan Fangli, Li Jinlin: Single-step pathway for the synthesis of tungsten nanosized powders by RF induction thermal plasma. Int J Refract Met Hard Mat 2012, 31, 33. <http://dx.doi.org/10.1016/j.ijrmhm.2011.09.002>
  • Yu J., Ong H. C., Wong K. Y., Lau W. M., Matsumoto S.: Morphology dependence of cathodoluminescence from cubic boron nitride films deposited by chemical vapor deposition. J Appl Phys 2006, 99, 124915. <http://dx.doi.org/10.1063/1.2205356>
  • Matsumoto Seiichiro, Zhang W.J: The introducing of fluorine into the deposition of BN: a successful method to obtain high-quality, thick cBN films with low residual stress. Diamond Related Mat 2001, 10, 1868. <http://dx.doi.org/10.1016/S0925-9635(01)00461-7>
  • Berghaus Jörg Oberste, Meunier Jean-Luc, Gitzhofer François: Diamond coatings for tool shafts by induction plasma deposition. Int J Refract Met Hard Mat 1998, 16, 201. <http://dx.doi.org/10.1016/S0263-4368(98)00029-8>
  • Matsumoto S., Chattopadhyay K. K., Mieno M., Ando T.: An attempt to prepare carbon nitride by thermal plasma chemical vapor deposition from graphite and nitrogen. J Mater Res 1998, 13, 180. <http://dx.doi.org/10.1557/JMR.1998.0024>
  • Berghaus J.O., Meunier J.-L., Gitzhofer F.: Local growth studies of CVD diamond using a probe-like substrate. IEEE Trans Plasma Sci 1997, 25, 1058. <http://dx.doi.org/10.1109/27.649626>
  • Cubertafon J.C., Chenevier M., Campargue A., Verven G., Priem T.: Emission spectroscopy diagnostics of a d.c. plasma jet diamond reactor. Diamond Related Mat 1995, 4, 350. <http://dx.doi.org/10.1016/0925-9635(94)05307-3>
  • Minoo H, Arsaoui A, Bouvier A: J Phys D Appl Phys 1995, 28, 1630. <http://dx.doi.org/10.1088/0022-3727/28/8/012>
  • Reeve S. W., Weimer W. A., Dandy D. S.: Diamond growth using remote methane injection in a direct current arcjet chemical vapor deposition reactor. Appl Phys Lett 1993, 63, 2487. <http://dx.doi.org/10.1063/1.110457>
  • Reeve S. W., Weimer W. A., Cerio F. M.: Gas phase chemistry in a direct current plasma jet diamond reactor. J Appl Phys 1993, 74, 7521. <http://dx.doi.org/10.1063/1.354978>