Pure and Applied Chemistry, 1992, Volume 64, No. 5, pp. 725-730, Cited by

Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 725-730

http://dx.doi.org/10.1351/pac199264050725

Novel approaches to plasma deposition of amorphous silicon-based materials

G. Bruno, P. Capezzuto and G. Cicala

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