Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 725-730
http://dx.doi.org/10.1351/pac199264050725
Novel approaches to plasma deposition of amorphous silicon-based materials
First page:
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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 725-730
http://dx.doi.org/10.1351/pac199264050725