Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 709-713
http://dx.doi.org/10.1351/pac199264050709
Dual atom beam studies of etching and related surface chemistries
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- Corbella Carles, Grosse-Kreul Simon, Kreiter Oliver, de los Arcos Teresa, Benedikt Jan, von Keudell Achim: Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces. Rev. Sci. Instrum. 2013, 84, 103303. <http://dx.doi.org/10.1063/1.4826066>
- Gou F., Kleyn A. W., Gleeson M. A.: The application of molecular dynamics to the study of plasma–surface interactions: CF x with silicon. Int Rev Phys Chem 2008, 27, 229. <http://dx.doi.org/10.1080/01442350801928014>
- Shen Jianwei, Yim Yong H., Feng Bingbing, Grill Verena, Evans Chris, Cooks R.Graham: Soft landing of ions onto self-assembled hydrocarbon and fluorocarbon monolayer surfaces. Int J Mass Spectrosc 1999, 182-183, 423. <http://dx.doi.org/10.1016/S1387-3806(98)14251-3>
- Pradeep T., Feng B., Ast T., Patrick J. S., Cooks R. G., Pachuta S. J.: Chemical modification of fluorinated self-assembled monolayer surfaces by low energy reactive ion bombardment. j am soc mass spectrom 1995, 6, 187. <http://dx.doi.org/10.1016/1044-0305(94)00110-L>
- Mullins C. B., Coburn J. W.: Ion-beam-assisted etching of Si with fluorine at low temperatures. J Appl Phys 1994, 76, 7562. <http://dx.doi.org/10.1063/1.357990>
- d’Agostino R., Fracassi F., Pacifico C.: Dry etching of Ti in chlorine containing feeds. J Appl Phys 1992, 72, 4351. <http://dx.doi.org/10.1063/1.352199>
- Coburn J.W.: Atomic and Molecular Beam Studies of Etching and Related Surface Chemistries. Mat Res Symp Proc 1992, 268, 3. <http://dx.doi.org/10.1557/PROC-268-3>