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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 703-707

http://dx.doi.org/10.1351/pac199264050703

Chemistry of titanium dry etching in fluorinated and chlorinated gases

F. Fracassi and R. d’Agostino

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  • Kasashima Yuji, Nabeoka Natsuko, Motomura Taisei, Uesugi Fumihiko: Many flaked particles caused by impulsive force of electric field stress and effect of electrostriction stress in mass-production plasma etching equipment. Jpn. J. Appl. Phys. 2014, 53, 040301. <http://dx.doi.org/10.7567/JJAP.53.040301>
  • Kim Sung-Yup, van Duin Adri C. T.: Simulation of Titanium Metal/Titanium Dioxide Etching with Chlorine and Hydrogen Chloride Gases Using the ReaxFF Reactive Force Field. J. Phys. Chem. A 2013, 117, 5655. <http://dx.doi.org/10.1021/jp4031943>
  • Domanski M, Luttge R, Lamers E, Walboomers X F, Winnubst L, Jansen J A, Gardeniers J G E: Submicron-patterning of bulk titanium by nanoimprint lithography and reactive ion etching. J Nanotechnol 2012, 23, 065306. <http://dx.doi.org/10.1088/0957-4484/23/6/065306>
  • Matsutani Akihiro, Hayashi Mikiro, Morii Yasushi, Nishioka Kunio, Isobe Toshihiro, Nakajima Akira, Matsushita Sachiko: SF6-Based Deep Reactive Ion Etching of (001) Rutile TiO2Substrate for Photonic Crystal Structure with Wide Complete Photonic Band Gap. Jpn. J. Appl. Phys. 2012, 51, 098002. <http://dx.doi.org/10.7567/JJAP.51.098002>
  • Batisse Nicolas, Guérin Katia, Dubois Marc, Hamwi André: The synthesis of microporous carbon by the fluorination of titanium carbide. Carbon 2011, 49, 2998. <http://dx.doi.org/10.1016/j.carbon.2011.03.018>
  • Lee Byunghong, Buchholz D. B., Guo Peijun, Hwang Dae-Kue, Chang R. P. H.: Optimizing the Performance of a Plastic Dye-Sensitized Solar Cell. J Phys Chem C 2011, 115, 9787. <http://dx.doi.org/10.1021/jp201555n>
  • Schoenaker F J, Córdoba R, Fernández-Pacheco R, Magén C, Stéphan O, Zuriaga-Monroy C, Ibarra M R, De Teresa J M: Focused electron beam induced etching of titanium with XeF2. J of Inst Physics Nanotechnology 2011, 22, 265304. <http://dx.doi.org/10.1088/0957-4484/22/26/265304>
  • Ecoffey Serge, Guilmain Marc, Morissette Jean-François, Bourque Frédéric, Pont Jérémy, Sang Bruno Lee, Drouin Dominique: Technology platform for the fabrication of titanium nanostructures. J Vac Sci B 2011, 29, 06FG06. <http://dx.doi.org/10.1116/1.3657517>
  • Alaeddine Ali, Genevois Cécile, Chevalier Laurence, Daoud Kaouther: STEM nanoanalysis of Au/Pt/Ti-Si3N4 interfacial defects and reactions during local stress of SiGe HBTs. Nanoscale Res Lett 2011, 6, 574. <http://dx.doi.org/10.1186/1556-276X-6-574>
  • Batisse Nicolas, Guérin Katia, Dubois Marc, Hamwi André, Spinelle Laurent, Tomasella Eric: Fluorination of silicon carbide thin films using pure F2 gas or XeF2. This Solid Films 2010, 518, 6746. <http://dx.doi.org/10.1016/j.tsf.2010.05.120>
  • Georgiev Grigor L., Sultana Taslema, Baird Ronald J., Auner Gregory, Newaz Golam, Patwa Rahul, Herfurth Hans: Laser bonding and characterization of Kapton® FN/Ti and Teflon® FEP/Ti systems. J Materials Sci 2009, 44, 882. <http://dx.doi.org/10.1007/s10853-008-3187-8>
  • Lindblom Magnus, Reinspach Julia, von Hofsten Olov, Bertilson Michael, Hertz Hans M., Holmberg Anders: High-aspect-ratio germanium zone plates fabricated by reactive ion etching in chlorine. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2009, 27, L1. <http://dx.doi.org/10.1116/1.3089371>
  • Baklanova N.I., Zaitsev B.N., Titov A.T., Zima T.M.: The chemistry, morphology, topography of titanium carbide modified carbon fibers. Carbon 2008, 46, 261. <http://dx.doi.org/10.1016/j.carbon.2007.11.019>
  • Baklanova N. I., Zima T. M., Titov A. T., Naimushina T. M., Berveno V. P.: Microstructure and strength of carbon fibers surface-modified with titanium carbide. Inorg Mater 2008, 44, 121. <http://dx.doi.org/10.1134/S0020168508020076>
  • Panaitescu E., Richter C., Menon L.: A Study of Titania Nanotube Synthesis in Chloride-Ion-Containing Media. J Electrochem Soc 2008, 155, E7. <http://dx.doi.org/10.1149/1.2800170>
  • Richter C., Panaitescu E., Willey R., Menon L.: Titania nanotubes prepared by anodization in fluorine-free acids. J Mater Res 2007, 22, 1624. <http://dx.doi.org/10.1557/JMR.2007.0203>