Pure and Applied Chemistry, 1992, Volume 64, No. 5, pp. 615-622

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Pure Appl. Chem., 1992, Vol. 64, No. 5, pp. 615-622

http://dx.doi.org/10.1351/pac199264050615

Electron and mass spectrometric analysis of plasma controlled surfaces and thin films

H. Oechsner

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X International Symposium on Plasma Chemistry, Bochum, Federal Republic of Germany, 4–9 August 1991

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