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Pure Appl. Chem., 1990, Vol. 62, No. 1, pp. 123-138

Laser-pulse-vaporization of refractory materials

D. R. Olander

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  • González-Leal J. M., Valverde J.: Design considerations for tailoring the thickness profile of transparent dielectric deposits by continuous-wave laser deposition. J. Appl. Phys. 2013, 113, 013108. <>
  • González-Leal J.M., Angel J.A., Rubio-Peña L., Valverde J.: Study of the growth of infrared-transparent non-spheric layer lenses by continuous-wave laser deposition. Thin Solid Films 2012. <>
  • Hutzler Nicholas R., Lu Hsin-I, Doyle John M.: The Buffer Gas Beam: An Intense, Cold, and Slow Source for Atoms and Molecules. Chem. Rev. 2012, 112, 4803. <>
  • Rubio-Peña L., Valverde J., Gámez A., González-Leal J.M., Angel J.A.: Study of the fabrication of infrared-transparent dielectric aspheric deposits by continuous-wave laser deposition. This Solid Films 2010, 518, 5530. <>
  • Padmanabhan P. V. A., Warrier K. G. K., Sinha Sucharita, Kutty T. R. G.: Pulsed laser deposition of lanthanum phosphate protective films. J Laser Appl 2009, 21, 149. <>
  • Belloni Fabio, Manara Dario, Pflieger Rachel, Colle Jean-Yves, Rondinella Vincenzo V.: High-temperature thermodynamics by laser-vaporization mass spectrometry: An approach based on statistical mechanics. ATOM SPECTROSC 2008, 63, 657. <>
  • Wang Hongxin, Salzberg A. P., Weiner Brad R.: Laser ablation of aluminum at 193, 248, and 351 nm. Appl Phys Lett 1991, 59, 935. <>
  • Balooch M., Tench R. J., Siekhaus W. J., Allen M. J., Connor A. L., Olander D. R.: Deposition of SiC films by pulsed excimer laser ablation. Appl Phys Lett 1990, 57, 1540. <>
  • Tench R. J., Balooch M., Bernardez L., Allen Mike J., Siekhaus W. J., Olander D. R., Wang W.: Cluster Formation in Laser-Induced Ablation and Evaporation of Solids Observed by Laser Ionization Time-Offlight Mass-Spectrometry and Scanning Tunneling Microscopy. MRS Proc 1990, 191, 85. <>