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Pure Appl. Chem., 1988, Vol. 60, No. 7, pp. 959-972

http://dx.doi.org/10.1351/pac198860070959

Solution photochemistry of poly(dialkylsilanes): a new class of photoresists

J. Michl, J. W. Downing, T. Karatsu, A. J. McKinley, G. Poggi, G. M. Wallraff, R. Sooriyakumaran and R. D. Miller

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