Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 815-820
http://dx.doi.org/10.1351/pac198860050815
Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films
Individual author index pages
Other PAC articles by these authors
Reduction of perfluorinated compound emissions using atmospheric pressure microwave plasmas: Mechanisms and energy efficiency
Plasmas and polymers: From laboratory to large scale commercialization
Processing of electronic materials by microwave plasma