Pure and Applied Chemistry, 1988, Volume 60, No. 5, pp. 815-820, Cited by

Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 815-820

http://dx.doi.org/10.1351/pac198860050815

Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films

M. R. Wertheimer, M. Moisan, J. E. Klemberg-Sapieha and R. Claude

García M. C., Varo M., Martínez P.: Excitation of Species in an Expanded Argon Microwave Plasma at Atmospheric Pressure. Plasma Chem Plasma Process 2010, 30, 241. <http://dx.doi.org/10.1007/s11090-010-9215-x>
Manolache S, Sarfaty M, Denes F: Plasma Sources Sci Technol 2000, 9, 37. <http://dx.doi.org/10.1088/0963-0252/9/1/307>
Sola A, Calzada M D, Gamero A: J Phys D Appl Phys 1995, 28, 1099. <http://dx.doi.org/10.1088/0022-3727/28/6/012>
Cholet V., Herbin R., Vandenbulcke L.: Low temperature boron coatings by microwave plasma assisted chemical vapour deposition. This Solid Films 1990, 192, 235. <http://dx.doi.org/10.1016/0040-6090(90)90069-P>
Martinu L., Klemberg-Sapieha J. E., Wertheimer M. R.: Dual-mode microwave/radio frequency plasma deposition of dielectric thin films. Appl Phys Lett 1989, 54, 2645. <http://dx.doi.org/10.1063/1.101566>