Pure and Applied Chemistry, 1988, Volume 60, No. 5, pp. 703-708

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Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 703-708

http://dx.doi.org/10.1351/pac198860050703

Plasma and gaseous etching of compounds of Groups III-V

D. E. Ibbotson

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Eighth International Symposium on Plasma Chemistry, Tokyo, Japan, 31 August–4 September 1987

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