Pure and Applied Chemistry, 1988, Volume 60, No. 5, pp. 633-644

Navigation

PAC → Archive → Vol. 60 (1988) → Issue 5 → Plasma deposition of amorphous silicon…

PAC Archives

RSS Feeds

ASAP articles Latest issue News IUPAC Reports and Recommendations

Highlights

Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 633-644

http://dx.doi.org/10.1351/pac198860050633

Plasma deposition of amorphous silicon films: an overview on some open questions

P. Capezzuto and G. Bruno

First page:

First page image

Conference

Eighth International Symposium on Plasma Chemistry, Tokyo, Japan, 31 August–4 September 1987

Full text - pdf 783 kB

Cited by 5 articles Other PAC articles by these authors

Previous abstract Next abstract