Pure Appl. Chem., 1987, Vol. 59, No. 7, pp. 857-868
http://dx.doi.org/10.1351/pac198759070857
Kinetics and mechanism of the thermolysis and photolysis of binary boranes
CrossRef Cited-by Linking
- Carenco Sophie, Portehault David, Boissière Cédric, Mézailles Nicolas, Sanchez Clément: Nanoscaled Metal Borides and Phosphides: Recent Developments and Perspectives. Chem. Rev. 2013, 113, 7981. <http://dx.doi.org/10.1021/cr400020d>
- Sun Baili, McKee Michael L.: Computational Study of the Initial Stage of Diborane Pyrolysis. Inorg. Chem. 2013, 52, 5962. <http://dx.doi.org/10.1021/ic4001957>
- Sun Baili, McKee Michael L.: Evaluating the Role of Triborane(7) As Catalyst in the Pyrolysis of Tetraborane(10). J. Phys. Chem. A 2013, 117, 9076. <http://dx.doi.org/10.1021/jp405621u>
- Liao Rongbao, Chai Lanlan, Sa Rongjian: A discussion on the electronic structure of arachno-borane B4H10 . Struc Chem 2012, 23, 841. <http://dx.doi.org/10.1007/s11224-011-9901-1>
- Yao Yansun, Hoffmann Roald: BH3 under Pressure: Leaving the Molecular Diborane Motif. S J Am Chem Soc 2011, 133, 21002. <http://dx.doi.org/10.1021/ja2092568>
- Jaroń Tomasz, Grochala Wojciech: Y(BH4)3—an old–new ternary hydrogen store aka learning from a multitude of failures. Dalton Trans 2010, 39, 160. <http://dx.doi.org/10.1039/b910698g>
- Deo N., Brewer J. R., Reinhardt C. E., Nikolić R. J., Cheung C. L.: Conformal filling of silicon micropillar platform with [sup 10]boron. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2008, 26, 1309. <http://dx.doi.org/10.1116/1.2939260>
- Söderlund Mats, Mäki-Arvela Päivi, Eränen Kari, Salmi Tapio, Rahkola Risto, Murzin Dmitry Yu.: Catalyst Deactivation in Diborane Decomposition. Catal Lett 2005, 105, 191. <http://dx.doi.org/10.1007/s10562-005-8690-9>
- Habuka Hitoshi, Akiyama Shoji, Otsuka Toru, Qu Wei-Feng: Instability of diborane gas in silicon epitaxial film growth. J Cryst Growth 2000, 209, 807. <http://dx.doi.org/10.1016/S0022-0248(99)00732-0>
- Pelter Andrew, Pardasani Ram T., Pardasani Pushpa: The Photochemistry of Boron Compounds. Tetrahedron 2000, 56, 7339. <http://dx.doi.org/10.1016/S0040-4020(00)00533-0>
- Fox Mark A., Greatrex R. Robert, Hofmann Matthias, Schleyer Paul Von R., Williams Robert E.: Gasphasenreaktion von Tetraboran(10) mit Allen: das fluktuierendearachno-1-Carbapentaboran(10)-Isomerensystem und die Derivate 1,2- und 1,3-Me2-1-CB4H8; Analogien bei 1-CB4H10, MeB5H10 und B5H10. Angew Chem 1997, 109, 1542. <http://dx.doi.org/10.1002/ange.19971091323>
- Kher Shreyas S., Tan Yexin, Spencer James T.: Chemical Vapor Deposition of Metal Borides, 4: The Application of Polyhedral Boron Clusters to the Chemical Vapor Deposition Formation of Gadolinium Boride Thin-film Materials. Appl Organometal Chem 1996, 10, 297. <http://dx.doi.org/10.1002/(SICI)1099-0739(199604)10:3/4<297::AID-AOC460>3.0.CO;2-D>
- Fox Mark A., Greatrex Robert, Hofmann Matthias, Von Ragué Schleyer Paul: Die Strukturen von Alkylderivaten desarachno-1-CB4H10 aus der Reaktion von B4H10 mit Alkinen. Angew Chem 1994, 106, 2384. <http://dx.doi.org/10.1002/ange.19941062215>
- Subramanian G., Jemmis Eluvathingal D.: Structure and stabilities of the isomers of SiB2H4. chem phys letts 1992, 200, 567. <http://dx.doi.org/10.1016/0009-2614(92)80092-P>
- Lee Sunwoo, Mazurowski John, Ramseyer G., Dowben P. A.: Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes. J Appl Phys 1992, 72, 4925. <http://dx.doi.org/10.1063/1.352060>
- Duke B.J., Gauld J.W., Schaefer H.F.: The structure of hydridogallium and hydridoaluminium bis(tetrahydroborates). chem phys letts 1991, 230, 306. <http://dx.doi.org/10.1016/0009-2614(94)01141-9>