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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1265-1276

Optical diagnostics of low pressure plasmas

R. W. Dreyfus, J. M. Jasinski, R. E. Walkup and G. S. Selwyn

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  • Zhang Pengyun, Sun Jizhong, Yao Lieming, Duan Xuru, Wu Jing: Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Radio-Frequency Discharge. Plasma Sci Tech 2011, 13, 561. <>
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  • Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Formation and decay of metastable fluorine atoms in pulsed fluorocarbon/oxygen discharges monitored by laser-induced fluorescence. Appl Phys Lett 1990, 56, 719. <>
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  • Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Heterogeneous processes in CF4/O2 plasmas probed using laser-induced fluorescence of CF2. J Appl Phys 1990, 68, 2013. <>
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  • McKillop John S., Forster John C., Holber William M.: Doppler profile measurement of Ar and Ar+ translational energies in a divergent magnetic field electron cyclotron resonance source. Appl Phys Lett 1989, 55, 30. <>
  • Mataras D., Cavadias S., Rapakoulias D.: Spatial profiles of reactive intermediates in rf silane discharges. J Appl Phys 1989, 66, 119. <>
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  • Hansen S. G., Luckman G., Colson Steven D.: Measurements of F∗, CF, and CF2 formation and decay in pulsed fluorocarbon discharges. Appl Phys Lett 1988, 53, 1588. <>
  • Keaton A. Landauer, Hess D. W.: Reaction of atomic and molecular bromine with aluminum. J Appl Phys 1988, 63, 533. <>
  • Selwyn G. S., Ai B. D., Singh J.: Real-time measurements of plasma/surface interaction by plasma-amplified photoelectron detection. Appl Phys Lett 1988, 52, 1953. <>
  • Jensen Klavs F.: Micro-reaction engineering applications of reaction engineering to processing of electronic and photonic materials. Chemical Engineering Science 1987, 42, 923. <>
  • d’Agostino Riccardo, Cramarossa Francesco, Illuzzi Francesca: Mechanisms of deposition and etching of thin films of plasma-polymerized fluorinated monomers in radio frequency discharges fed with C2F6-H2 and C2F6-O2 mixtures. J Appl Phys 1987, 61, 2754. <>
  • Richards Albert D., Thompson Brian E., Allen Kenneth D., Sawin Herbert H.: Atomic chlorine concentration measurements in a plasma etching reactor. I. A comparison of infrared absorption and optical emission actinometry. J Appl Phys 1987, 62, 792. <>
  • Selwyn Gary S.: Atomic arsenic detection by ArF laser-induced fluorescence. Appl Phys Lett 1987, 51, 167. <>
  • Cairns J. A., Smailes R., Blaikley D. C. W., Banks P. M., Hancock G., Hussla I., Katzschner W.: A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl3 and Cl2 Plasmas. Mater Res Soc Proc 1987, 98, 121. <>
  • Selwyn Gary S.: Spatially resolved detection of O atoms in etching plasmas by two-photon laser-induced fluorescence. J Appl Phys 1986, 60, 2771. <>
  • Matsumi Yutaka, Toyoda Satoru, Hayashi Toshio, Miyamura Masao, Yoshikawa Hideshi, Komiya Souji: Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals. J Appl Phys 1986, 60, 4102. <>
  • Walkup R. E., Saenger K. L., Selwyn G. S.: Studies of atomic oxygen in O2+CF4 rf discharges by two-photon laser-induced fluorescence and optical emission spectroscopy. J Chem Phys 1986, 84, 2668. <>
  • Wagner J., Wild Ch., Pohl F., Koidl P.: Optical studies of hydrogenated amorphous carbon plasma deposition. Appl Phys Lett 1986, 48, 106. <>