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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1265-1276

http://dx.doi.org/10.1351/pac198557091265

Optical diagnostics of low pressure plasmas

R. W. Dreyfus, J. M. Jasinski, R. E. Walkup and G. S. Selwyn

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  • Park Wanjae, Lee WooHyun, Kim Wan-Soo, Kim Hyuk, Whang Ki-Woong: Characteristics of reactive ion etching lag in HBr/O2plasma etching of silicon trench for nanoscale device. Jpn. J. Appl. Phys. 2014, 53, 036502. <http://dx.doi.org/10.7567/JJAP.53.036502>
  • Tian Yunfei, Wu Peng, Wu Xi, Jiang Xiaoming, Xu Kailai, Hou Xiandeng: Corona discharge radical emission spectroscopy: a multi-channel detector with nose-type function for discrimination analysis. Analyst 2013, 138, 2249. <http://dx.doi.org/10.1039/c3an36859a>
  • Chan Mu-Hsuan, Lu Fu-Hsing: Air-based deposition and processing windows of sputtered TiN, TiNxOy, and N-doped TiOx thin films. Surface and Coatings Technology 2012, 210, 135. <http://dx.doi.org/10.1016/j.surfcoat.2012.09.004>
  • Mavadat M, Ricard A, Sarra-Bournet C, Laroche G: Determination of ro-vibrational excitations of N2(B, v′) and N2(C, v′) states in N2 microwave discharges using visible and IR spectroscopy. J Phys D Appl Phys 2011, 44, 155207. <http://dx.doi.org/10.1088/0022-3727/44/15/155207>
  • Zhang Pengyun, Sun Jizhong, Yao Lieming, Duan Xuru, Wu Jing: Diagnostics of Parameters by Optical Emission Spectroscopy and Langmuir Probe in Mixtures (SiH4/C2H4/Ar) Radio-Frequency Discharge. Plasma Sci Tech 2011, 13, 561. <http://dx.doi.org/10.1088/1009-0630/13/5/10>
  • Trevino Kristina J., Fisher Ellen R.: Detection Limits and Decomposition Mechanisms for Organic Contaminants in Water Using Optical Emission Spectroscopy. Plasma Process Polym 2009, 6, 180. <http://dx.doi.org/10.1002/ppap.200800098>
  • Britun N, Gaillard M, Han J G: Laser induced fluorescence for Ti and Ti+ density characterization in a magnetron discharge. J Phys D Appl Phys 2008, 41, 185201. <http://dx.doi.org/10.1088/0022-3727/41/18/185201>
  • Saloum S, Naddaf M, Alkhaled B: Diagnostics of N2–Ar plasma mixture excited in a 13.56 MHz hollow cathode discharge system: application to remote plasma treatment of polyamide surface. J Phys D Appl Phys 2008, 41, 045205. <http://dx.doi.org/10.1088/0022-3727/41/4/045205>
  • DeJoseph C A, Demidov V I, Blessington J: Comparison of helium two-step plasma emission with that predicted from measured cross sections. J Phys B At Mol Opt Phys 2008, 41, 085701. <http://dx.doi.org/10.1088/0953-4075/41/8/085701>
  • Britun Nikolay, Gaillard Mireille, Kim Yong Mo, Kim Kab Seog, Han Jeon-Geon: Use of optical absorption spectroscopy for the characterization of an Ar−Ti magnetron discharge. Met Mater -Int 2007, 13, 483. <http://dx.doi.org/10.1007/BF03027907>
  • Boudam M K, Saoudi B, Moisan M, Ricard A: Characterization of the flowing afterglows of an N2–O2 reduced-pressure discharge: setting the operating conditions to achieve a dominant late afterglow and correlating the NOβ UV intensity variation with the N and O atom densities. J Phys D Appl Phys 2007, 40, 1694. <http://dx.doi.org/10.1088/0022-3727/40/6/019>
  • Brown Michael S., Scofield James D., Ganguly Biswa N.: Emission, thermocouple, and electrical measurements in SF[sub 6]/Ar/O[sub 2] SiC etching discharges. J Appl Phys 2003, 94, 822. <http://dx.doi.org/10.1063/1.1580197>
  • Brown Michael S, Ganguly Biswa N, Garscadden Alan: Plasma Sources Sci Technol 2002, 11, 190. <http://dx.doi.org/10.1088/0963-0252/11/2/310>
  • Neuhäuser M., Bärwulf S., Hilgers H., Lugscheider E., Riester M.: Optical emission spectroscopy studies of titanium nitride sputtering on thermoplastic polymers. Surface and Coatings Technology 1999, 116-119, 981. <http://dx.doi.org/10.1016/S0257-8972(99)00214-5>
  • Behle St., Georg A., Yuan Y., Engemann J., Brockhaus A.: Imaging of atomic oxygen in a microwave excited oxygen plasma with two-dimensional optical emission spectroscopy. Surface Coatings and Technology 1997, 97, 734. <http://dx.doi.org/10.1016/S0257-8972(97)00169-2>
  • Gómez-Aleixandre C., Sánchez O., Vázquez L., García M. M., Albella J. M.: Influence of Methane Concentration on the Nucleation and Growth Stages in Diamond Film Deposition. phys stat sol (a) 1996, 154, 23. <http://dx.doi.org/10.1002/pssa.2211540104>
  • Andry P. S., Pastel P. W., Varhue W. J.: Comparison of diamond-like carbon film deposition by electron cyclotron resonance with benzene and methane. J Mater Res 1996, 11, 221. <http://dx.doi.org/10.1557/JMR.1996.0027>
  • Reeve S. W., Weimer W. A., Dandy D. S.: On the optimization of a dc arcjet diamond chemical vapor deposition reactor. J Mater Res 1996, 11, 694. <http://dx.doi.org/10.1557/JMR.1996.0084>
  • Engelhard M., Jacob W., Möller W., Koch A. W.: New calibration method for the determination of the absolute density of CH radicals through laser-induced fluorescence. Appl Opt 1995, 34, 4542. <http://dx.doi.org/10.1364/AO.34.004542>
  • Lee Jung H., Kim Dong S., Lee Young H.: Effect of Ion Bombardment on the Structure and Properties of PECVD SiO2. Mat Res Symp Proc 1994, 363, 107. <http://dx.doi.org/10.1557/PROC-363-107>
  • Andari J. Al, Diamy A. M., Legrand J. C., Ben-Aim R. I.: Air microwave-induced plasma: Relation between ion density and atomic oxygen density. Plasma Chem Plasma Process 1993, 13, 103. <http://dx.doi.org/10.1007/BF01447173>
  • Favia Pietro, Fracassi Francesco, d'AGOSTINO Riccardo: X-ray photoelectron spectroscopy of plasma-polymerized films from tetramethylsilane-containing feeds. Journal of Biomaterials Science, Polymer Edition 1993, 4, 61. <http://dx.doi.org/10.1163/156856292X00303>
  • Zarrabian S., Lee C., Guenther K. H.: Emission spectroscopy of reactive low-voltage ion plating for metal-oxide thin films. Appl Opt 1993, 32, 5606. <http://dx.doi.org/10.1364/AO.32.005606>
  • Occhiello E., Morra M., Cinquina P., Garbassi F.: Hydrophobic recovery of oxygen-plasma-treated polystyrene. Poly 1992, 33, 3007. <http://dx.doi.org/10.1016/0032-3861(92)90088-E>
  • Durrant Steven F., Mota Rogério P., Bica de Moraes Mário A.: Relationships between the plasma environment and the composition and optical properties of plasma-polymerized thin films produced in rf discharges of C2H2-SF6 mixtures. J Appl Phys 1992, 71, 448. <http://dx.doi.org/10.1063/1.350676>
  • Angell David, Oehrlein Gottlieb S.: Grazing angle optical emission interferometry for end-point detection. Appl Phys Lett 1991, 58, 240. <http://dx.doi.org/10.1063/1.104701>
  • Booth J. P., Joubert O., Pelletier J., Sadeghi N.: Oxygen atom actinometry reinvestigated: Comparison with absolute measurements by resonance absorption at 130 nm. J Appl Phys 1991, 69, 618. <http://dx.doi.org/10.1063/1.347395>
  • Collart E. J. H., Baggerman J. A. G., Visser R. J.: Excitation mechanisms of oxygen atoms in a low pressure O2 radio-frequency plasma. J Appl Phys 1991, 70, 5278. <http://dx.doi.org/10.1063/1.350237>
  • Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Formation and decay of metastable fluorine atoms in pulsed fluorocarbon/oxygen discharges monitored by laser-induced fluorescence. Appl Phys Lett 1990, 56, 719. <http://dx.doi.org/10.1063/1.102692>
  • Radovanov S. B., Tomčik B., Petrović Z. Lj., Jelenković B. M.: Optical emission spectroscopy of rf discharge in SF6. J Appl Phys 1990, 67, 97. <http://dx.doi.org/10.1063/1.345211>
  • Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Heterogeneous processes in CF4/O2 plasmas probed using laser-induced fluorescence of CF2. J Appl Phys 1990, 68, 2013. <http://dx.doi.org/10.1063/1.346551>
  • Coburn J.W.: Mass spectrometric studies of positive ions in r.f. glow discharges. This Solid Films 1989, 171, 65. <http://dx.doi.org/10.1016/0040-6090(89)90034-5>
  • McKillop John S., Forster John C., Holber William M.: Doppler profile measurement of Ar and Ar+ translational energies in a divergent magnetic field electron cyclotron resonance source. Appl Phys Lett 1989, 55, 30. <http://dx.doi.org/10.1063/1.101739>
  • Mataras D., Cavadias S., Rapakoulias D.: Spatial profiles of reactive intermediates in rf silane discharges. J Appl Phys 1989, 66, 119. <http://dx.doi.org/10.1063/1.343915>
  • Kline Larry E., Kushner Mark J.: Computer simulation of materials processing plasma discharges. Crit Rev Solid State Mater Sci 1989, 16, 1. <http://dx.doi.org/10.1080/10408438908244626>
  • Hansen S. G., Luckman G., Colson Steven D.: Measurements of F∗, CF, and CF2 formation and decay in pulsed fluorocarbon discharges. Appl Phys Lett 1988, 53, 1588. <http://dx.doi.org/10.1063/1.100436>
  • Keaton A. Landauer, Hess D. W.: Reaction of atomic and molecular bromine with aluminum. J Appl Phys 1988, 63, 533. <http://dx.doi.org/10.1063/1.340083>
  • Selwyn G. S., Ai B. D., Singh J.: Real-time measurements of plasma/surface interaction by plasma-amplified photoelectron detection. Appl Phys Lett 1988, 52, 1953. <http://dx.doi.org/10.1063/1.99587>
  • Jensen Klavs F.: Micro-reaction engineering applications of reaction engineering to processing of electronic and photonic materials. Chemical Engineering Science 1987, 42, 923. <http://dx.doi.org/10.1016/0009-2509(87)80052-0>
  • d’Agostino Riccardo, Cramarossa Francesco, Illuzzi Francesca: Mechanisms of deposition and etching of thin films of plasma-polymerized fluorinated monomers in radio frequency discharges fed with C2F6-H2 and C2F6-O2 mixtures. J Appl Phys 1987, 61, 2754. <http://dx.doi.org/10.1063/1.337864>
  • Richards Albert D., Thompson Brian E., Allen Kenneth D., Sawin Herbert H.: Atomic chlorine concentration measurements in a plasma etching reactor. I. A comparison of infrared absorption and optical emission actinometry. J Appl Phys 1987, 62, 792. <http://dx.doi.org/10.1063/1.339734>
  • Selwyn Gary S.: Atomic arsenic detection by ArF laser-induced fluorescence. Appl Phys Lett 1987, 51, 167. <http://dx.doi.org/10.1063/1.98910>
  • Cairns J. A., Smailes R., Blaikley D. C. W., Banks P. M., Hancock G., Hussla I., Katzschner W.: A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl3 and Cl2 Plasmas. Mater Res Soc Proc 1987, 98, 121. <http://dx.doi.org/10.1557/PROC-98-121>
  • Selwyn Gary S.: Spatially resolved detection of O atoms in etching plasmas by two-photon laser-induced fluorescence. J Appl Phys 1986, 60, 2771. <http://dx.doi.org/10.1063/1.337109>
  • Matsumi Yutaka, Toyoda Satoru, Hayashi Toshio, Miyamura Masao, Yoshikawa Hideshi, Komiya Souji: Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals. J Appl Phys 1986, 60, 4102. <http://dx.doi.org/10.1063/1.337489>
  • Walkup R. E., Saenger K. L., Selwyn G. S.: Studies of atomic oxygen in O2+CF4 rf discharges by two-photon laser-induced fluorescence and optical emission spectroscopy. J Chem Phys 1986, 84, 2668. <http://dx.doi.org/10.1063/1.450339>
  • Wagner J., Wild Ch., Pohl F., Koidl P.: Optical studies of hydrogenated amorphous carbon plasma deposition. Appl Phys Lett 1986, 48, 106. <http://dx.doi.org/10.1063/1.96967>