Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1253-1264
http://dx.doi.org/10.1351/pac198557091253
Elementary processes in plasma-surface interactions with emphasis on ions
CrossRef Cited-by Linking
- Jang Inkook, Ni Boris, Sinnott Susan B.: Study of angular influence of C[sub 3]H[sub 5]+] ion deposition on polystyrene surfaces using molecular dynamics simulations. J Vac Sci Technol A 2002, 20, 564. <http://dx.doi.org/10.1116/1.1454127>
- Wijesundara M. B. J., Hanley L., Ni B., Sinnott S. B.: Effects of unique ion chemistry on thin-film growth by plasma-surface interactions. Proceedings of the National Academy of Sciences 2000, 97, 23. <http://dx.doi.org/10.1073/pnas.97.1.23>
- Beulens J.J., Buuron A.J.M., Schram D.C.: Carbon deposition using an expanding cascaded arc d.c. plasma. Surface Coatings and Technology 1991, 47, 401. <http://dx.doi.org/10.1016/0257-8972(91)90306-H>
- Coburn J W: Mechanisms in Plasma-assisted Etching. Phys Scr 1988, t23, 258. <http://dx.doi.org/10.1088/0031-8949/1988/T23/048>
- Schram D C, Bisschops Th H J, Kroesen G M W, Hoog F J de: Plasma surface modification and plasma chemistry. Plasma Phys Control Fusion 1987, 29, 1353. <http://dx.doi.org/10.1088/0741-3335/29/10A/316>