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Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1207-1222

http://dx.doi.org/10.1351/pac198557091207

Progress in the applications of plasma surface modifications and correlations with the chemical properties of the plasma phase

J. Amouroux, A. Gicquel, S. Cavvadias, D. Morvan and F. Arefi

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  • Denes F., Sarmadi A. M., Nayar S., Ying T. H., Hop C. E. C. A., Young R. A.: Silicon contamination of polypropylene films from glass reactors in a BCl3 RF cold plasma. Polym Bull 1993, 31, 351. <http://dx.doi.org/10.1007/BF00692963>
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  • Amouroux J., Morvan D., Gicquel A.: Plasma for special applications. Fresenius Zeitschrift fur Analytische Chemie 1986, 324, 384. <http://dx.doi.org/10.1007/BF00474111>
  • Goldstein R.J, Pfender E, Ibele W.E, Ramsey J.W, Simon T.W, Decker N.A, Kuehn T.H, Lee H.O, Girshick S.L, Eckert E.R.G: Heat transfer—a review of 1985 literature. International Journal Heat Mass Transfer 1986, 29, 1767. <http://dx.doi.org/10.1016/0017-9310(86)90002-5>