Pure and Applied Chemistry

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• Ishpal, Kumar Sushil, Dwivedi Neeraj, Rauthan C. M. S.: Investigation of radio frequency plasma for the growth of diamond like carbon films. Phys Plasmas 2012, 19, 033515. <http://dx.doi.org/10.1063/1.3694855>
• Feng Chunlei, Wang Liping, Wang Yan, Gao Liang, Ding Hongbin: Diagnosis of Active Species in Reactive Acetylene Plasma by Laser-Ionization Molecular-Beam Time-of-Flight Mass Spectrometry. Plasma Chem Plasma Process 2011, 31, 405. <http://dx.doi.org/10.1007/s11090-011-9295-2>
• Feng Chun-Lei, Gao Liang, Liu Jia-Hong, Zhang Lei, Ding Hongbin: Laser mass-spectrometry for online diagnosis of reactive plasmas with many species. Rev Sci Instrum 2011, 82, 063110. <http://dx.doi.org/10.1063/1.3600798>
• Thamban P. L. Stephan, Hosch Jimmy, Goeckner M. J.: Controllable optical emission spectroscopy diagnostic system for analysis of process chemistries. Rev Sci Instrum 2010, 81, 013502. <http://dx.doi.org/10.1063/1.3276706>
• Koirala S.P., Abu-safe H.H., Mensah S.L., Naseem H.A., Gordon M.H.: Langmuir probe and optical emission studies in a radio frequency (rf) magnetron plasma used for the deposition of hydrogenated amorphous silicon. Surface Coatings and Technology 2008, 203, 602. <http://dx.doi.org/10.1016/j.surfcoat.2008.05.014>
• Durrant Steven F., da Cruz Nilson C., Rangel Elidiane C., Bica de Moraes Mario A.: Plasma enhanced chemical vapor deposition of titanium (IV) ethoxide–oxygen–helium mixtures. This Solid Films 2008, 516, 4940. <http://dx.doi.org/10.1016/j.tsf.2007.09.036>
• DeJoseph C A, Demidov V I, Blessington J: Comparison of helium two-step plasma emission with that predicted from measured cross sections. J Phys B At Mol Opt Phys 2008, 41, 085701. <http://dx.doi.org/10.1088/0953-4075/41/8/085701>
• Stillahn Joshua M., Trevino Kristina J., Fisher Ellen R.: Plasma Diagnostics for Unraveling Process Chemistry. Annu Rev Anal Chem 2008, 1, 261. <http://dx.doi.org/10.1146/annurev.anchem.1.031207.112953>
• Abdel-Rahman M, Gans T, Gathen V Schulz-von der, Döbele H F: Space and time resolved rotational state populations and gas temperatures in an inductively coupled hydrogen RF discharge. Plasma Sources Sci Technol 2005, 14, 51. <http://dx.doi.org/10.1088/0963-0252/14/1/007>
• Mariotti Davide, Maguire Paul, Mahony Charles M O, McLaughlin James: Analysis of excitation processes and electron temperature changes from spectral data in a dc micro plasma discharge. Plasma Sources Sci Technol 2004, 13, 576. <http://dx.doi.org/10.1088/0963-0252/13/4/004>
• Simek M: The modelling of streamer-induced emission in atmospheric pressure, pulsed positive corona discharge: N2 second positive and NO-$\gamma$ systems. J Phys D Appl Phys 2002, 35, 1967. <http://dx.doi.org/10.1088/0022-3727/35/16/311>
• Seifarth H., Schmidt J.U., Grötzschel R., Klimenkov M.: Phenomenological model of reactive r.f.-magnetron sputtering of Si in Ar/O2 atmosphere for the prediction of SiOx thin film stoichiometry from process parameters. This Solid Films 2001, 389, 108. <http://dx.doi.org/10.1016/S0040-6090(01)00872-0>
• Bica de Moraes Mario A, Rouxinol Francisco P, Durrant Steven F: Gas-phase and plasma-surface reactions in radiofrequency discharges of C2H2–N2–noble gas mixtures. This Solid Films 2001, 398-399, 156. <http://dx.doi.org/10.1016/S0040-6090(01)01460-2>
• Skiff F., Bachet G., Doveil F.: Ion dynamics in nonlinear electrostatic structures. Phys Plasmas 2001, 8, 3139. <http://dx.doi.org/10.1063/1.1379044>
• Yi Jeong W, Lee Young H, Farouk Bakhtier: Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma. This Solid Films 2000, 374, 103. <http://dx.doi.org/10.1016/S0040-6090(00)01021-X>
• Materer N., Goodman Rory S., Leone Stephen R.: Comparison of electron cyclotron resonance and radio-frequency inductively coupled plasmas of Ar and N[sub 2]: Neutral kinetic energies and source gas cracking. J Appl Phys 1998, 83, 1917. <http://dx.doi.org/10.1063/1.366916>
• Lamendola Ritalba, d’Agostino Riccardo, Fracassi Francesco: Thin film deposition from hexamethyldisiloxane fed glow discharges. Plasmas Polym 1997, 2, 147. <http://dx.doi.org/10.1007/BF02766151>
• Durrant Steven F., Castro Sandra G.C., Bolívar-Marinez Luz Elena, Galvão Douglas S., Bica de Moraes Mário A.: Structural and optical properties of amorphous hydrogenated fluorinated carbon films produced by PECVD. This Solid Films 1997, 304, 149. <http://dx.doi.org/10.1016/S0040-6090(97)00308-8>
• Santos D.C.R., Santos F.P., Mota R.P., Honda R.Y., Algatti M.A.: Optical and electrical diagnostics measurements of plasmas generated in aromatic compounds. Surface Coatings and Technology 1997, 94-95, 686. <http://dx.doi.org/10.1016/S0257-8972(97)00510-0>
• Moshkalyov Stanislav, Machida Munemasa, Campos Delton, Dulkin Alexander: Secondary photon emission in plasma processing. Appl Phys Lett 1997, 70, 2478. <http://dx.doi.org/10.1063/1.118862>
• Francis A., Czarnetzki U., Döbele H. F., Sadeghi N.: Quenching of the 750.4 nm argon actinometry line by H[sub 2] and several hydrocarbon molecules. Appl Phys Lett 1997, 71, 3796. <http://dx.doi.org/10.1063/1.120555>
• Durrant Steven F., Bica de Moraes Mário A.: Dynamic actinometric optical emission spectroscopy for the elucidation of plasma processes in the production of fluorinated amorphous hydrogenated carbon films from glow discharges. This Solid Films 1996, 277, 115. <http://dx.doi.org/10.1016/0040-6090(95)08021-X>
• Bellakhal N., Draou K., Cheron B.G., Brisset J.L.: Copper oxides formation by a low pressure RF oxygen plasma. Mater Sci & Eng B 1996, 41, 206. <http://dx.doi.org/10.1016/S0921-5107(96)01674-1>
• Kinrot U., Goldsmith S., Boxman R.L.: Monochromatic imaging of cathodic arc plasma. IEEE Trans Plasma Sci 1996, 24, 71. <http://dx.doi.org/10.1109/27.491696>
• Andry P. S., Pastel P. W., Varhue W. J.: Comparison of diamond-like carbon film deposition by electron cyclotron resonance with benzene and methane. J Mater Res 1996, 11, 221. <http://dx.doi.org/10.1557/JMR.1996.0027>
• Reeve S. W., Weimer W. A., Dandy D. S.: On the optimization of a dc arcjet diamond chemical vapor deposition reactor. J Mater Res 1996, 11, 694. <http://dx.doi.org/10.1557/JMR.1996.0084>
• Daugherty J. E., Graves D. B.: Derivation and experimental verification of a particulate transport model for a glow discharge. J Appl Phys 1995, 78, 2279. <http://dx.doi.org/10.1063/1.360145>
• Stoffels E., Stoffels W., Vender D., Kando M., Kroesen G., de Hoog F.: Negative ions in a radio-frequency oxygen plasma. Phys Rev E 1995, 51, 2425. <http://dx.doi.org/10.1103/PhysRevE.51.2425>
• Engelhard M., Jacob W., Möller W., Koch A. W.: New calibration method for the determination of the absolute density of CH radicals through laser-induced fluorescence. Appl Opt 1995, 34, 4542. <http://dx.doi.org/10.1364/AO.34.004542>
• Tserepi Angeliki D., Miller Terry A.: Two-photon absorption laser-induced fluorescence of H atoms: A probe for heterogeneous processes in hydrogen plasmas. J Appl Phys 1994, 75, 7231. <http://dx.doi.org/10.1063/1.356680>
• Jenq Jyh-Shyang, , Taylor J W, Hershkowitz N: Plasma Sources Sci Technol 1994, 3, 154. <http://dx.doi.org/10.1088/0963-0252/3/2/005>
• Besner A., Margot J., Bordeleau S., Hubert J.: Spatially resolved distribution of excited species in an argon surface-wave produced plasma at intermediate pressures (10–600 torr) obtained by tomography. ATOM SPECTROSC 1993, 48, 985. <http://dx.doi.org/10.1016/S0584-8547(05)80004-7>
• Goeckner M. J., Goree J., Sheridan T. E.: Saturation broadening of laser-induced fluorescence from plasma ions. Rev Sci Instrum 1993, 64, 996. <http://dx.doi.org/10.1063/1.1144103>
• Zarrabian S., Lee C., Guenther K. H.: Emission spectroscopy of reactive low-voltage ion plating for metal-oxide thin films. Appl Opt 1993, 32, 5606. <http://dx.doi.org/10.1364/AO.32.005606>
• Durrant Steven F., Mota Rogério P., de Moraes Mario A.B.: Fluorinated polymer films from r.f. plasmas containing benzene and sulfur hexafluorine. This Solid Films 1992, 220, 295. <http://dx.doi.org/10.1016/0040-6090(92)90588-3>
• Visser R. J., Baggerman J. A. G., Poppelaars J. P. J., Collart E. J. H.: The time evolution of the ion density and the gas temperature in pulsed radio frequency plasmas. J Appl Phys 1992, 71, 5792. <http://dx.doi.org/10.1063/1.350473>
• Durrant Steven F., Mota Rogério P., Bica de Moraes Mário A.: Relationships between the plasma environment and the composition and optical properties of plasma-polymerized thin films produced in rf discharges of C2H2-SF6 mixtures. J Appl Phys 1992, 71, 448. <http://dx.doi.org/10.1063/1.350676>
• Tserepi Angeliki D., Dunlop James R., Preppernau Bryan L., Miller Terry A.: Absolute H-atom concentration profiles in continuous and pulsed rf discharges. J Appl Phys 1992, 72, 2638. <http://dx.doi.org/10.1063/1.351564>
• Fantoni R., Giorgi M., Moliterni A.G.G., Berden W.C.M., Lazic V., Martini O., Polla Mattiot F.: On-line gas-phase optical diagnostics in plasma CVD deposition of carbon films. J Mater Res 1992, 7, 1204. <http://dx.doi.org/10.1557/JMR.1992.1204>
• Okuyama F., Hayashi H., Iwai H.: Diagnosis of radio-frequency silane and silane-nitrogen plasmas based on field ionization mass spectrometry. Surf Sei 1991, 246, 408. <http://dx.doi.org/10.1016/0039-6028(91)90444-W>
• Manenschijn A., van der Drift E., Janssen G. C. A. M., Radelaar S.: Cl2 reactive ion etching mechanisms studied by in situ determination of ion energy and ion flux. J Appl Phys 1991, 69, 7996. <http://dx.doi.org/10.1063/1.347495>
• Colgan M., Kwon N., Li Y., Murnick D.: Time- and space-resolved electron-impact excitation rates in an rf glow discharge. Phys Rev Letters 1991, 66, 1858. <http://dx.doi.org/10.1103/PhysRevLett.66.1858>
• Sadeghi N., Debontride H., Turban G., Peignon M. C.: Kinetics of formation of sulfur dimers in pure SF6 and SF6-O2 discharges. Plasma Chem Plasma Process 1990, 10, 553. <http://dx.doi.org/10.1007/BF01447264>
• Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Formation and decay of metastable fluorine atoms in pulsed fluorocarbon/oxygen discharges monitored by laser-induced fluorescence. Appl Phys Lett 1990, 56, 719. <http://dx.doi.org/10.1063/1.102692>
• Radovanov S. B., Tomčik B., Petrović Z. Lj., Jelenković B. M.: Optical emission spectroscopy of rf discharge in SF6. J Appl Phys 1990, 67, 97. <http://dx.doi.org/10.1063/1.345211>
• Gerassimou D. E., Cavadias S., Mataras D., Rapakoulias D. E.: Nitrogen ion dynamics in low-pressure nitrogen plasma and plasma sheath. J Appl Phys 1990, 67, 146. <http://dx.doi.org/10.1063/1.345293>
• Buchmann L.-M., Heinrich F., Hoffmann P., Janes J.: Analysis of a CF4/O2 plasma using emission, laser-induced fluorescence, mass, and Langmuir spectroscopy. J Appl Phys 1990, 67, 3635. <http://dx.doi.org/10.1063/1.345317>
• Celii F. G., Thorsheim H. R., Butler J. E., Plano L. S., Pinneo J. M.: Detection of ground-state atomic hydrogen in a dc plasma using third-harmonic generation. J Appl Phys 1990, 68, 3814. <http://dx.doi.org/10.1063/1.346263>
• Hansen S. G., Luckman G., Nieman George C., Colson Steven D.: Heterogeneous processes in CF4/O2 plasmas probed using laser-induced fluorescence of CF2. J Appl Phys 1990, 68, 2013. <http://dx.doi.org/10.1063/1.346551>
• Coburn J.W.: Mass spectrometric studies of positive ions in r.f. glow discharges. This Solid Films 1989, 171, 65. <http://dx.doi.org/10.1016/0040-6090(89)90034-5>
• Cook J. G., Das S. R.: Emission spectroscopy diagnostics of a magnetron sputter discharge. J Appl Phys 1989, 65, 1846. <http://dx.doi.org/10.1063/1.342918>
• Booth J. P., Hancock G., Perry N. D., Toogood M. J.: Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma. J Appl Phys 1989, 66, 5251. <http://dx.doi.org/10.1063/1.343712>
• Kline Larry E., Kushner Mark J.: Computer simulation of materials processing plasma discharges. Crit Rev Solid State Mater Sci 1989, 16, 1. <http://dx.doi.org/10.1080/10408438908244626>
• Hansen S. G., Luckman G., Colson Steven D.: Measurements of F∗, CF, and CF2 formation and decay in pulsed fluorocarbon discharges. Appl Phys Lett 1988, 53, 1588. <http://dx.doi.org/10.1063/1.100436>
• Cleland T. A., Hess D. W.: Measurement of rotational temperature and dissociation in N2O glow discharges using in situ Fourier transform infrared spectroscopy. J Appl Phys 1988, 64, 1068. <http://dx.doi.org/10.1063/1.341891>
• Jabbour Z. J., Blanks K. A., Martus K. E., Becker K.: Continuous ultraviolet emissions produced by electron impact on SF6 and NF3. J Chem Phys 1988, 88, 4252. <http://dx.doi.org/10.1063/1.453833>
• Selwyn G. S., Ai B. D., Singh J.: Real-time measurements of plasma/surface interaction by plasma-amplified photoelectron detection. Appl Phys Lett 1988, 52, 1953. <http://dx.doi.org/10.1063/1.99587>
• Dreyfus R. W.: What Limits Laser Probing?. Mat Res Symp Proc 1988, 117, 11. <http://dx.doi.org/10.1557/PROC-117-11>
• Greene Wayne M., Hartney Mark A., Hess Dennis W., Oldham William G.: Ion Current, Energy Distribution, and Radical Species Detection in RF Plasmas by Cylindrical Mirror Analyzer Quadrupole Mass Spectroscopy. Mat Res Symp Proc 1988, 117, 61. <http://dx.doi.org/10.1557/PROC-117-61>
• Cleland T. A., Hess D. W.: In situ FTIR diagnostics of the radio-frequency plasma decomposition of N2O. Plasma Chem Plasma Process 1987, 7, 379. <http://dx.doi.org/10.1007/BF01030485>
• Jensen Klavs F.: Micro-reaction engineering applications of reaction engineering to processing of electronic and photonic materials. Chemical Engineering Science 1987, 42, 923. <http://dx.doi.org/10.1016/0009-2509(87)80052-0>
• Richards Albert D., Thompson Brian E., Allen Kenneth D., Sawin Herbert H.: Atomic chlorine concentration measurements in a plasma etching reactor. I. A comparison of infrared absorption and optical emission actinometry. J Appl Phys 1987, 62, 792. <http://dx.doi.org/10.1063/1.339734>
• Booth J. P., Hancock G., Perry N. D.: Laser induced fluorescence detection of CF and CF2 radicals in a CF4/O2 plasma. Appl Phys Lett 1987, 50, 318. <http://dx.doi.org/10.1063/1.98214>
• Selwyn Gary S.: Atomic arsenic detection by ArF laser-induced fluorescence. Appl Phys Lett 1987, 51, 167. <http://dx.doi.org/10.1063/1.98910>
• Pan Fu-shih, Oka Takeshi: Radial distribution of molecular ions in the positive column of dc glow discharges using infrared diode-laser spectroscopy. Phys Rev A 1987, 36, 2297. <http://dx.doi.org/10.1103/PhysRevA.36.2297>
• Boeuf J.-P.: Numerical model of rf glow discharges. Phys Rev A 1987, 36, 2782. <http://dx.doi.org/10.1103/PhysRevA.36.2782>
• Hino Masayasu, Aono Takashi, Nakajima Masato, Yuta Shinichi: Light emission computed tomography system for plasma diagnostics. Appl Opt 1987, 26, 4742. <http://dx.doi.org/10.1364/AO.26.004742>
• Cairns J. A., Smailes R., Blaikley D. C. W., Banks P. M., Hancock G., Hussla I., Katzschner W.: A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl3 and Cl2 Plasmas. Mater Res Soc Proc 1987, 98, 121. <http://dx.doi.org/10.1557/PROC-98-121>
• Selwyn Gary S.: Spatially resolved detection of O atoms in etching plasmas by two-photon laser-induced fluorescence. J Appl Phys 1986, 60, 2771. <http://dx.doi.org/10.1063/1.337109>
• Breiland William G., Ho Pauline, Coltrin Michael E.: Gas-phase silicon atoms in silane chemical vapor deposition: Laser-excited fluorescence measurements and comparisons with model predictions. J Appl Phys 1986, 60, 1505. <http://dx.doi.org/10.1063/1.337280>
• Matsumi Yutaka, Toyoda Satoru, Hayashi Toshio, Miyamura Masao, Yoshikawa Hideshi, Komiya Souji: Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals. J Appl Phys 1986, 60, 4102. <http://dx.doi.org/10.1063/1.337489>
• Kramer Jerry: The optogalvanic effect in a 13.56-MHz chlorine discharge. J Appl Phys 1986, 60, 3072. <http://dx.doi.org/10.1063/1.337763>
• Walkup R. E., Saenger K. L., Selwyn G. S.: Studies of atomic oxygen in O2+CF4 rf discharges by two-photon laser-induced fluorescence and optical emission spectroscopy. J Chem Phys 1986, 84, 2668. <http://dx.doi.org/10.1063/1.450339>
• Wagner J., Wild Ch., Pohl F., Koidl P.: Optical studies of hydrogenated amorphous carbon plasma deposition. Appl Phys Lett 1986, 48, 106. <http://dx.doi.org/10.1063/1.96967>
• Chollet P., Guelachvili G., Morillon-Chapey M., Gressier P., Schmitt J. P. M.: High-information infrared spectroscopy of unstable molecules. J Opt Soc Am B 1986, 3, 687. <http://dx.doi.org/10.1364/JOSAB.3.000687>
• Wagner J., Wild Ch., Bubenzer A., Koidl P.: Characterization of Hydrocarbon Plasma used for a-C:H Deposition. Mater Res Soc Proc 1986, 68, 205. <http://dx.doi.org/10.1557/PROC-68-205>
• Coburn J.W., Winters Harold F., Okano J., Ochiai T., Nishimura H., Ogama T., Kurokawa H., Karino I.: Plasma-assisted etching: Ion-assisted surface chemistry. Applications of Surface Science 1985, 22-23, 63. <http://dx.doi.org/10.1016/0378-5963(85)90037-6>
• Stern R. A.: Laser/ion-beam diagnostics for potential and magnetic-field measurements in plasmas (invited). Rev Sci Instrum 1985, 56, 1006. <http://dx.doi.org/10.1063/1.1138253>
• Gottscho Richard A.: Automated pressure scanning of tunable dye lasers. Rev Sci Instrum 1985, 56, 529. <http://dx.doi.org/10.1063/1.1138280>
• Rogoff Gerald L.: Optical probe for spatially resolved plasma emission and absorption spectroscopy. Appl Opt 1985, 24, 1733. <http://dx.doi.org/10.1364/AO.24.001733>
• Gottscho Richard A., Donnelly Vincent M.: Optical emission actinometry and spectral line shapes in rf glow discharges. J Appl Phys 1984, 56, 245. <http://dx.doi.org/10.1063/1.333954>
• DiMauro L. F., Gottscho Richard A., Miller Terry A.: Two-photon laser-induced fluorescence monitoring of O atoms in a plasma etching environment. J Appl Phys 1984, 56, 2007. <http://dx.doi.org/10.1063/1.334242>
• Walkup R., Avouris Ph., Dreyfus R. W., Jasinski J. M., Selwyn G. S.: Laser detection of diatomic products of plasma sputtering and etching. Appl Phys Lett 1984, 45, 372. <http://dx.doi.org/10.1063/1.95280>
• Knickelbein Mark B., Webb Douglas A., Grant Edward R.: New Devices for the Production of Intense Pulsed Jets of CF2: Laser Spectroscopic Characterization. Mat Res Symp Proc 1984, 38, 23. <http://dx.doi.org/10.1557/PROC-38-23>