Pure Appl. Chem., 1982, Vol. 54, No. 7, pp. 1297-1311
http://dx.doi.org/10.1351/pac198254071297
Principles and applications of chemical vapor deposition (CVD)
CrossRef Cited-by Linking
- Qu Chengjuan, Myllymaa Sami, Prittinen Juha, Koistinen Arto P., Lappalainen Reijo, Lammi Mikko J.: Osteoblast behavior on various ultra short pulsed laser deposited surface coatings. Materials Science and Engineering: C 2013, 33, 1676. <http://dx.doi.org/10.1016/j.msec.2012.12.078>
- Ozaydin-Ince Gozde, Coclite Anna Maria, Gleason Karen K: CVD of polymeric thin films: applications in sensors, biotechnology, microelectronics/organic electronics, microfluidics, MEMS, composites and membranes. Rep Prog Phy 2012, 75, 016501. <http://dx.doi.org/10.1088/0034-4885/75/1/016501>
- Alf Mahriah E., Asatekin Ayse, Barr Miles C., Baxamusa Salmaan H., Chelawat Hitesh, Ozaydin-Ince Gozde, Petruczok Christy D., Sreenivasan Ramaswamy, Tenhaeff Wyatt E., Trujillo Nathan J.: Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films. Adv Mater 2009, 22, 1993. <http://dx.doi.org/10.1002/adma.200902765>
- Gruehn Reginald, Schweizer Hans-Jürgen: Feststoffpräparation durch chemischen Transport - Interpretation und Steuerung mit dem Kooperativen Transport-Modell. Angew Chem 2006, 95, 80. <http://dx.doi.org/10.1002/ange.19830950204>
- Kumashiro Y., Yoshizawa H., Yokoyama T.: Epitaxial Growth of Rhombohedral Boron Phosphide Single Crystalline Films by Chemical Vapor Deposition. J Solid State Chem 1997, 133, 104. <http://dx.doi.org/10.1006/jssc.1997.7324>
- Benzinger W., Becker A., H�ttinger K.J.: Chemistry and kinetics of chemical vapour deposition of pyrocarbon: I. Fundamentals of kinetics and chemical reaction engineering. Carbon 1996, 34, 957. <http://dx.doi.org/10.1016/0008-6223(96)00010-3>
- Vincent C., Scharff J. P., Vincent H., Bouix J., Lofti N., Kannan T. S.: Chemical interaction during the chemical vapour deposition of silicon carbide on aluminosilicate fibres from halogenated precursors. J Materials Sci 1994, 29, 1. <http://dx.doi.org/10.1007/BF00356565>
- Van Dieten V.E.J., Dekker J.P., Schoonman J.: Thin Film Fuel Cells. Mat Res Symp Proc 1994, 369, 669. <http://dx.doi.org/10.1557/PROC-369-669>
- Pons M., Bernard C., Madar R.: Numerical modelling for CVD simulation and process optimization: coupled thermochemical and mass transport approaches. Surface Coatings and Technology 1993, 61, 274. <http://dx.doi.org/10.1016/0257-8972(93)90238-J>
- Ilyinyh N.I, Moiseev G.K, Vatolin N.A, Šesták J: Thermodynamic simulation of YBa2Cu3Ox deposition from the vapor/gas phase. Thermochimica 1992, 198, 357. <http://dx.doi.org/10.1016/0040-6031(92)85091-9>
- Golda E. Michael, Gallois B.: Chemical Vapor Deposition of Multiphase Boron-Carbon-Silicon Ceramics. Mat Res Symp Proc 1991, 250, 167. <http://dx.doi.org/10.1557/PROC-250-167>
- Davis Robert F.: Correlation Among Process Routes, Microstructures and Properties of Chemically Vapor Deposited Silicon Carbide. Mater Res Soc Proc 1989, 168, 145. <http://dx.doi.org/10.1557/PROC-168-145>
- Spear Karl E., Dirkx Ryan R.: Predicting The Chemistry In Cvd Systems. Mater Res Soc Proc 1989, 168, 19. <http://dx.doi.org/10.1557/PROC-168-19>
- Doll G.L., Sakya R.M., Nicholls J.T., Speck J.S., Dresselhaus M.S., Engle G.B.: Electronic and structural studies of carbon/carbon composites. Synthetic Metal 1988, 23, 481. <http://dx.doi.org/10.1016/0379-6779(88)90525-5>
- Lachter A., Trinquecoste M., Delhaes P.: Fabrication of carbon/carbon composites by d.c. plasma enhanced C.V.D. of carbon. Carbon 1985, 23, 111. <http://dx.doi.org/10.1016/0008-6223(85)90205-2>
- Gruehn Reginald, Schweizer Hans-Jürgen: Preparation of Solid-State Compounds by Chemical Transport—Interpretation and Control Using the Cooperative Transport Model. Angew Chem Int Ed Engl 1983, 22, 82. <http://dx.doi.org/10.1002/anie.198300821>
- Wan C.F., Spear K.E.: CVD of niobium germanides from partially reacted input gases. Calphad J 1983, 7, 149. <http://dx.doi.org/10.1016/0364-5916(83)90020-2>
- KINGON ANGUS I., LUTZ LEONARD J., LIAW P., DAVIS ROBERT F.: Thermodynamic Calculations for the Chemical Vapor Deposition of Silicon Carbide. J Amer Ceram Soc 1983, 66, 558. <http://dx.doi.org/10.1111/j.1151-2916.1983.tb10091.x>