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Pure Appl. Chem., 1982, Vol. 54, No. 6, pp. 1197-1220

http://dx.doi.org/10.1351/pac198254061197

Highlights of preparative solid state chemistry in low pressure plasmas

S. Veprek

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  • Chan Mei Lin, Yoxall Brian, Park Hyunkyu, Kang Zhaoyi, Izyumin Igor, Chou Jeffrey, Megens Mischa M., Wu Ming C., Boser Bernhard E., Horsley David A., Choi Seokheun, Chae Junseok, Yokoyama Yoshinori, Murakami Takaaki, Izuo Shinichi, Yoshida Yukihisa, Itoh Toshihiro: Design and characterization of MEMS micromotor supported on low friction liquid bearing. Sensors and Actuators A: Physical 2012, 177, 1. <http://dx.doi.org/10.1016/j.sna.2011.10.025>
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  • Vepřek S.: Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: Present status and future trends. Plasma Chem Plasma Process 1989, 9, 29S. <http://dx.doi.org/10.1007/BF01015872>
  • Cocke David L, Owens Michael S: Reactivity of metal oxide overlayers: Formation of metal carbides. Journal of Colloid and Interface Science 1989, 131, 166. <http://dx.doi.org/10.1016/0021-9797(89)90155-0>
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  • Schmitt J.P.M.: Amorphous silicon deposition: Industrial and technical challenges. This Solid Films 1989, 174, 193. <http://dx.doi.org/10.1016/0040-6090(89)90889-4>
  • Ensslen K., Vepřek S.: Dominant reaction channels and the mechanism of silane decomposition in a H2-Si(s)-SiH4 glow discharge. Plasma Chem Plasma Process 1987, 7, 139. <http://dx.doi.org/10.1007/BF01019174>
  • Halverson D.E., Cocke D.L.: Investigation of plasma-grown planar alumina films for use in the modeling of bulk alumina. This Solid Films 1987, 155, 133. <http://dx.doi.org/10.1016/0040-6090(87)90459-7>
  • Inspektor-Koren Aharon: Principles of plasma-activated chemical vapour deposition. Surface Coatings and Technology 1987, 33, 31. <http://dx.doi.org/10.1016/0257-8972(87)90174-5>
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  • Veprek S., Sarott F., Iqbal Z.: Effect of grain boundaries on the Raman spectra, optical absorption, and elastic light scattering in nanometer-sized crystalline silicon. Phys Rev B 1987, 36, 3344. <http://dx.doi.org/10.1103/PhysRevB.36.3344>
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  • Vepřek S.: Plasma-induced and plasma-assisted chemical vapour deposition. This Solid Films 1985, 130, 135. <http://dx.doi.org/10.1016/0040-6090(85)90303-7>
  • Cocke David L., Johnson Erik D., Merrill Robert P.: Planar Models for Alumina-Based Catalysts. Catal Rev —Sci Eng 1984, 26, 163. <http://dx.doi.org/10.1080/01614948408078064>
  • Wagner John J., Vepřek S.: Chemical relaxation study of the heterogeneous silicon-hydrogen system under plasma conditions. Plasma Chem Plasma Process 1983, 3, 219. <http://dx.doi.org/10.1007/BF00566021>
  • Gimzewski J.K., Vepřek S.: Investigation of the initial stages of oxidation of microcrystalline silicon by means of X-ray photoelectron spectroscopy. Solid Stat Comm 1983, 47, 747. <http://dx.doi.org/10.1016/0038-1098(83)90648-8>
  • Catherine Y., Zamouche A., Bullot J., Gauthier M.: Ion bombardment effects in plasma deposition of hydrogenated amorphous silicon carbide films: A comparative study of d.c. and r.f. discharges. This Solid Films 1983, 109, 145. <http://dx.doi.org/10.1016/0040-6090(83)90134-7>
  • Iqbal Z, Sarott F -A, Veprek S: J Phys C Solid State Phys 1983, 16, 2005. <http://dx.doi.org/10.1088/0022-3719/16/10/029>
  • Veprek S, Iqbal Z, Kuhne R O, Capezzuto P, Sarott F -A, Gimzewski J K: J Phys C Solid State Phys 1983, 16, 6241. <http://dx.doi.org/10.1088/0022-3719/16/32/015>