Pure and Applied Chemistry, 1980, Volume 52, No. 7, pp. 1817-1827, Cited by

Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1817-1827

http://dx.doi.org/10.1351/pac198052071817

Plasma processing of oxide systems in the temperature range 1000-3000 K

C. B. Alcock

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