Pure and Applied Chemistry, 1980, Volume 52, No. 7, pp. 1817-1827

Navigation

PAC → Archive → Vol. 52 (1980) → Issue 7 → Plasma processing of oxide systems in…

PAC Archives

RSS Feeds

ASAP articles Latest issue News IUPAC Reports and Recommendations

Highlights

Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1817-1827

http://dx.doi.org/10.1351/pac198052071817

Plasma processing of oxide systems in the temperature range 1000-3000 K

C. B. Alcock

First page:

First page image

Conference

Round Table on Thermal Plasma Processing, Zurich, Switzerland, 27 August–1 September 1979

Full text - pdf 223 kB

Cited by 7 articles Other PAC articles by these authors

Previous abstract Next abstract