Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1817-1827
http://dx.doi.org/10.1351/pac198052071817
Plasma processing of oxide systems in the temperature range 1000-3000 K
First page:
![First page image](/publications/pac/pdf/first_pages/5207x1817.jpg)
Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1817-1827
http://dx.doi.org/10.1351/pac198052071817