Pure and Applied Chemistry, 1978, Volume 50, No. 5, pp. 435-447

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Pure Appl. Chem., 1978, Vol. 50, No. 5, pp. 435-447

http://dx.doi.org/10.1351/pac197850050435

Gas phase diffusion and surface reactions in the chemical vapour deposition of silicon

J. Bloem

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26th International Congress of Pure and Applied Chemistry, Tokyo, Japan, 4–10 September 1977

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