Pure and Applied Chemistry

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• Veprek Stan, Veprek-Heijman Maritza J.G.: Industrial applications of superhard nanocomposite coatings. Surface Coatings and Technology 2008, 202, 5063. <http://dx.doi.org/10.1016/j.surfcoat.2008.05.038>
• Gruehn Reginald, Schweizer Hans-Jürgen: Feststoffpräparation durch chemischen Transport - Interpretation und Steuerung mit dem Kooperativen Transport-Modell. Angew Chem 2006, 95, 80. <http://dx.doi.org/10.1002/ange.19830950204>
• Rider A. N., Lamb R. N., Koch M. H.: Low-power r.f. plasma oxidation of aluminium. Surf Interface Anal 2001, 31, 302. <http://dx.doi.org/10.1002/sia.978>
• Meng Zhaoyu, Peng Yiya, Yang Zhiping, Qian Yitai: Synthesis and Characterization of Amorphous Phosphorus Nitride. Chem Lett 2000, 1252. <http://dx.doi.org/10.1246/cl.2000.1252>
• Bruno G., Capezzuto P., Losurdo M.: Chemistry and kinetics of the interaction of hydrogen atoms with (100) InP surfaces: An in situ real-time ellipsometric study. Phys Rev B 1996, 54, 17175. <http://dx.doi.org/10.1103/PhysRevB.54.17175>
• Janča J., Skrřička L., Brablec A.: Simple and quick rotational temperature determination in N2-containing discharge plasma. Plasma Chem Plasma Process 1993, 13, 567. <http://dx.doi.org/10.1007/BF01465883>
• Patscheider Jörg, Vepřek Stan: Plasma-induced deposition of thin films of aluminum oxide. Plasma Chem Plasma Process 1992, 12, 129. <http://dx.doi.org/10.1007/BF01447442>
• Vepřek S., Heintze M.: The mechanism of plasma-induced deposition of amorphous silicon from silane. Plasma Chem Plasma Process 1990, 10, 3. <http://dx.doi.org/10.1007/BF01460445>
• Vepřek S.: Preparation of inorganic materials, surface treatment, and etching in low pressure plasmas: Present status and future trends. Plasma Chem Plasma Process 1989, 9, 29S. <http://dx.doi.org/10.1007/BF01015872>
• Vepřek S., Eckmann Ch., Elmer J. Th.: Recent progress in the restoration of archeological metallic artifacts by means of low-pressure plasma treatment. Plasma Chem Plasma Process 1988, 8, 445. <http://dx.doi.org/10.1007/BF01016059>
• Rubel Marek, Tjong S.C., Ho N.J.: Plasma-induced erosion of monocrystalline alloy surfaces. Materials Science and Engineering 1987, 91, L9. <http://dx.doi.org/10.1016/0025-5416(87)90312-0>
• Halverson D.E., Cocke D.L.: Investigation of plasma-grown planar alumina films for use in the modeling of bulk alumina. This Solid Films 1987, 155, 133. <http://dx.doi.org/10.1016/0040-6090(87)90459-7>
• Inspektor-Koren Aharon: Principles of plasma-activated chemical vapour deposition. Surface Coatings and Technology 1987, 33, 31. <http://dx.doi.org/10.1016/0257-8972(87)90174-5>
• Vepřek S., Patscheider J., Elmer J.: Restoration and conservation of ancient artifacts: A new area of application of plasma chemistry. Plasma Chem Plasma Process 1985, 5, 201. <http://dx.doi.org/10.1007/BF00566215>
• Vepřek S.: Plasma-induced and plasma-assisted chemical vapour deposition. This Solid Films 1985, 130, 135. <http://dx.doi.org/10.1016/0040-6090(85)90303-7>
• Cocke David L., Johnson Erik D., Merrill Robert P.: Planar Models for Alumina-Based Catalysts. Catal Rev —Sci Eng 1984, 26, 163. <http://dx.doi.org/10.1080/01614948408078064>
• Gruehn Reginald, Schweizer Hans-Jürgen: Preparation of Solid-State Compounds by Chemical Transport—Interpretation and Control Using the Cooperative Transport Model. Angew Chem Int Ed Engl 1983, 22, 82. <http://dx.doi.org/10.1002/anie.198300821>
• Mexmain J. M., Morvan D., Bourdin E., Amouroux J., Fauchais P.: Thermodynamic study of the ways of preparing silicon, and its application to the preparation of photovoltaic silicon by the plasma technique. Plasma Chem Plasma Process 1983, 3, 393. <http://dx.doi.org/10.1007/BF00564627>
• Brewer R.J., Gimzewski J.K., Vepřek S., Stuessi H.: Effect of surface contamination and pretreatment on the hydrogen diffusion into and out of titanium under plasma conditions. J  Nucl Mater 1981, 103, 465. <http://dx.doi.org/10.1016/0022-3115(82)90641-9>
• Iqbal Z., Vepřek S., Webb A.P., Capezzuto P.: Raman scattering from small particle size polycrystalline silicon. Solid Stat Comm 1981, 37, 993. <http://dx.doi.org/10.1016/0038-1098(81)91202-3>
• Sellschopp M., Rücker N.: Thermal and plasma-chemical conversion of cadmium into α-CdS. This Solid Films 1981, 83, 273. <http://dx.doi.org/10.1016/0040-6090(81)90679-9>
• Extance P., Elliott S. R.: Pressure dependence of the electrical conductivity of amorphous red phosphorus. Philosophical Magazine Part B 1981, 43, 469. <http://dx.doi.org/10.1080/01418638108222110>
• Extance P., Elliott S. R.: Pressure dependence of the electrical properties of amorphous phosphorus prepared by chemical transport in a low-pressure hydrogen plasma. Philosophical Magazine Part B 1981, 43, 485. <http://dx.doi.org/10.1080/01418638108222111>
• Vepřek S., Iqbal Z., Brunner J., Schärli M.: Preparation and properties of amorphous phosphorus nitride prepared in a low-pressure plasma. Philosophical Magazine Part B 1981, 43, 527. <http://dx.doi.org/10.1080/01418638108222114>
• Veprek S, Iqbal Z, Oswald H R, Webb A P: J Phys C Solid State Phys 1981, 14, 295. <http://dx.doi.org/10.1088/0022-3719/14/3/013>
• Webb A.P., Brewer R., Stuessi H., Vepřek S.: Further results on the erosion of carbon materials by hydrogen plasma. J  Nucl Mater 1980, 93-94, 634. <http://dx.doi.org/10.1016/0022-3115(80)90185-3>
• Iqbal Z., Webb A. P., Vepřek S.: Polycrystalline silicon films deposited in a glow discharge at temperatures below 250 °C. Appl Phys Lett 1980, 36, 163. <http://dx.doi.org/10.1063/1.91416>
• Beyeler H. U., Vepřek S.: Radial distribution function of amorphous phosphorus prepared by chemical transport in a low-pressure hydrogen plasma. Philosophical Magazine Part B 1980, 41, 327. <http://dx.doi.org/10.1080/13642818008245388>
• Webb A.P., Vepřek S.: Recativity of solid silicon with hydrogen under conditions of a low pressure plasma. chem phys letts 1979, 62, 173. <http://dx.doi.org/10.1016/0009-2614(79)80436-4>
• Braganza C., Stüssi H., Vepřek S.: Interaction of nitrided titanium with a hydrogen plasma. J  Nucl Mater 1979, 87, 331. <http://dx.doi.org/10.1016/0022-3115(79)90569-5>
• Brodsky M.H.: Plasma preparations of amorphous silicon films. This Solid Films 1978, 50, 57. <http://dx.doi.org/10.1016/0040-6090(78)90092-5>
• Spear W. E., Le Comber P. G., Vepřek S., Wild R.: Electronic properties of amorphous phosphorus prepared by chemical transport in a glow discharge. Philosophical Magazine Part B 1978, 38, 349. <http://dx.doi.org/10.1080/13642817808245336>
• Vepřek S., Webb A.P., Oswald H.R., Stuessi H.: Effect of radiation damage on the erosion of graphite by atomic hydrogen. J  Nucl Mater 1977, 68, 32. <http://dx.doi.org/10.1016/0022-3115(77)90213-6>